Used AMAT / APPLIED MATERIALS P5000 Mark II #9401169 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a high-performance reactor developed by AMAT to enable advanced research, development and production of advanced thin films and other micro-structured materials. It offers precision controls to enable deposition process optimization, including laser energy fluence and residence time control. AMAT P5000 Mark II delivers a potent combination of advanced technology and engineering, allowing for unprecedented thin film characterizations. The reactor is outfitted with a scanning electron microscope for advances in thin film thickness measurement, as well as an optical spectrometer for measuring the concentration of dominant species in the deposited material. APPLIED MATERIALS P 5000 MARK II combines an ultra-clean chamber with an efficient gas distribution system to ensure excellent control of surface conditions and deposition rate. The reactor also features a highly efficient embedded computer system which is able to store multiple processing parameters and optimize deposition processes. The dimensions of APPLIED MATERIALS P5000 Mark II are 46.5 cm in length, 31.7 cm wide and 22.9 cm high, with a chamber volume of 45.3 litres. It features a process pressure range of 5.33 - 6.65 x 10-5 Torr, and a variable working frequency ranging from 4 kHz to 14 GHz. The temperature range of the reactor is 100°C - 950°C, with a maximum temperature stability of ±1°C, and an optimal process temperature uniformity of ±5°C. The primary feature of P 5000 MARK II is its high-precision deposition process control, allowing for excellent and consistent layer-to-layer thin film characterization. The high deposition rate and excellent uniformity also allow for significantly reduced deposition times and increased productivity. Moreover, P5000 Mark II is designed for easy integration with additional tools of the Applies Materials system, such as plasma sources, thin film monitors, gas analyzers, and particle detection systems. This enables end-to-end process control from substrate to finished product. Overall, AMAT / APPLIED MATERIALS P 5000 MARK II is an ultra-clean and efficient reactor for thin film deposition and characterization, delivering superior thin film performance and excellent substrate coverage in a variety of materials processing applications.