Used AMAT / APPLIED MATERIALS P5000 Mark II #9402055 for sale
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ID: 9402055
Wafer Size: 8"
Vintage: 1995
CVD System, 8"
Process: PE SiH4 Oxide / Nitride
Clamp cassette indexer
HDD: SSD Type
FDD: SCSI, 3.5"
Elevator type: 8 Slots, 8"
Robot type: AMAT Standard
Blade: Standard, 8"
I/O Sensor and door
Center finder
Vacuum sensor
Standard slit value
Fore line
Signal tower: R / Y / G / B
Standard AC Rack
ENI OEM-12B-07 RF Generator
(3) RF Matching network
Heater exchanger
Does not include pump
Remote AC rack
Heat Exchanger: AMAT-1
Mini controller
POU Filter
Throttle valve: Cluster
Isolation valve: Nor-Cal
Lamp driver
Process chamber:
(3) Chambers: A, B, C
Type: DLH One-hole standard
CERAMIC Hoop wafer lift type
Heater: Lamp type
Lid assembly: O-Ring
Susceptor missing
Process kit:
Heater window
Lamp
Lift pin
Susceptor / Wafer lift bellows
Water Flow Switch:
A and B (modified)
C-Proteus switch
Gas panel:
Type: Standard
MFC: STEC
PNEUMATIC Value: Nupro
Manual shut off
Gas: SiH4 / N2O / NH3 / CF4 / C3F8 / C2F6 / He / N2
Chamber A:
Gas / MFC
N2 / 1000
N2 / 300
O2 / 20
N2 / 3000
N2 / 1000
N2 / 500
Chamber B:
Gas / MFC
N2 / 1000
N2 / 300
N2 / 300
O2 / 20
N2 / 1000
SiH4 / 500
Chamber C:
Gas / MFC
N2 / 1000
N2 / 1000
Ar / 100
N2 / 3000
N2 / 1000
N2 / 5000
Main DC power supply
VME DC power supply
1995 vintage.
AMAT / APPLIED MATERIALS P5000 Mark II reactor is a generalized semiconductor device production equipment designed to address a wide range of high-volume applications, including those requiring both high purity and low temperature deposition characteristics. AMAT P5000 Mark II is highly customizable, allowing users to adapt it to meet a number of different process requirements. It features high-speed rotating electron beam sources and advanced scanning capabilities, allowing for rapid production rates. APPLIED MATERIALS P 5000 MARK II reactor also features advanced gas and chemical management systems, ensuring that ingredients are accurately dosed and that reactive byproducts are rapidly and safely removed. AMAT / APPLIED MATERIALS P 5000 MARK II features a powerful embedded controller, allowing users to program sophisticated processes from one easy-to-use interface. A range of temperature control capabilities ensure the highest possible product quality during wafer fabrication. The control system includes alarm monitoring capabilities, allowing users to keep their devices running smoothly with minimal downtime. AMAT P 5000 MARK II also includes advanced monitoring and data logging capabilities, allowing for monitoring of integral parameters throughout the process. P 5000 MARK II provides a highly flexible distance-to-wafer variable (DTWV), allowing for up to five distinct distance settings to be configured on a single reactor head. This means that users can easily scale their wafer fabrication setup without having to purchase multiple reactors. APPLIED MATERIALS P5000 Mark II can also be configured with a wide range of physical options, such as robot mounts and custom enclosures. P5000 Mark II is a reliable and powerful device production unit. Its cutting-edge technological capabilities make it the perfect solution for high-volume processes with exacting requirements. It can easily be configured to meet the specific needs of industrial applications, with the necessary levels of control, monitoring, and data logging. With its robust built-in control machine and its easy scalability, AMAT / APPLIED MATERIALS P5000 Mark II is a reliable and advanced semiconductor device production solution.
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