Used AMAT / APPLIED MATERIALS P5000 Mark II #9411664 for sale
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ID: 9411664
Wafer Size: 6"
Poly etcher, 6"
Hard Disk Drive (HDD) SDD Flash hard
Floppy Disk Dive (FDD), 3.5"
Storage elevator: 8-Slots
Cassette indexer: Standard clamp type
(3) Chambers
Process chamber: ABD, PE-TEOS
(3) Baratron gauges: MKS 627A, 20 Torr
(3) Chamber body: One hole chambers, 8"
Lid assembly, 8"
Standard robot blade
(3) ENI OEM 12B RF Generators
(3) Gas panels
NUPRO/FUJIKIN Pneumatic/Shut-off valve
(3) RF Matchers standard
(3) Slit valves standard
(3) Throttle valves, C-plug
(3) Susceptors P-chuck, 6-8"
(3) Process kits, 8"
Lift assembly
O-Ring
(42) Lamps
Mini controller
Remote AC Rack standard type
Remote AC Rack to MF cable, 55 feet
Remote monitor cable, 25 feet
Pump/Heat exchanger cable, 25 feet
AMAT-0 Heat exchanger
Heat exchanger water hose color flex, 55 feet
(3) TEOS Delivery line heaters
(3) TEOS G-Plis
LF 410A-EVD / IV-2410-02H
(2) HORIBA Z512 / GF 100
N2, (5) SLM / O2-s (3) SLM / He 5000 SCCM / C2F6 500 SCCM
(2) LCD Touch / Light pen monitors
(2) Monitor racks.
AMAT / APPLIED MATERIALS P5000 Mark II is a widely used reactor, designed for the processing of advanced semiconductor materials. The equipment consists of a process chamber, a pump, a heater, and a gas control system, which enable it to achieve a wide range of process temperatures and gas flows with accuracy and precision. The process chamber is made of stainless steel and has two 8 inch exits for gas exhaust and pump lines. The gas flows are controlled with three independent gas lines and can be configured for a wide range of pressures and flow rates. The chamber is also equipped with a process window for viewing the sample and for controlling wafer movement. The heater, on the other hand, is designed to provide high uniformity and accuracy, and maintain steady and precise temperatures during the process. It is equipped with a quartz oven, which maintains the desired temperature more precisely than conventional heaters. The pump is capable of providing very high vacuum and can control pressure accurately. The control range of the pump is from 0.1 to 10 Torr, and it has a water-cooled turbo molecular pump for low-vacuum operations. The gas control unit is used for controlling the process gases. It consists of mass flow controllers, which control the amount of gases being supplied, valves for switching and diverting gases, and regulators for controlling the pressure. The machine is also equipped with several safety measures, such as a safety monitor and an emergency stop switch. This ensures a safe operation and protects the equipment and the user from any dangerous situation. Overall, AMAT P5000 Mark II is a reliable and reliable process chamber, capable of carrying out a wide range of semiconductor processes. It is capable of accurately controlling temperatures, pressures, and flow rates, and providing a safe working environment.
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