Used AMAT / APPLIED MATERIALS P5000 Mark ll #9186958 for sale

AMAT P5000 Mark 11 is a high-performance, affordable, and reliable etching reactor used to fabricate thin films for semiconductor and other optoelectronic applications. It is a proven and reliable all-in-one solution for a wide range of oxide, nitride, and metals etch applications. It can be used for patterned and pattern-less etching of metals, oxides, nitrides, and other dielectric materials. The machine is fully automated with advanced integrated hardware and software that enable high-speed etching and high process yields. APPLIED MATERIALS P5000 Mark 11 features a number of key components, including a RF generator, RF and ICP Etch Cables, a Side-Loading Wafer Placement Chamber, a Transparent Pressure System and an advanced software suite. The RF generator is capable of running up to 50kW of RF power across up to 200MHz in frequency. The RF and ICP etch cables enable additional etch control and optimization. The side-loading wafer placement chamber maximizes throughput in small, medium, and large batches of wafers while ensuring consistent wafer placement and orientation. AMAT / APPLIED MATERIALS P5000 Mark 11 utilizes a unique Transparent Pressure System (TPS) which is capable of carrying out both reactive and non-reactive etch processes in a continuous single-chamber environment, eliminating the need for multiple chambers and the manual transfer of wafers. The TPS also enables precise pressure control to ensure process control and repeatability. The integrated software suite includes a Windows-based graphical user interface that provides users with powerful performance, process information, and reliability. AMAT P5000 Mark 11 is an ideal choice for IC and optoelectronics manufacturing applications such as the production of compound semiconductors, thin films for solar cells, and MEMS, among others. Its high speed, cost-effectiveness, and reliability make it an excellent choice for the etching of metals, oxides, and nitrides. The software suite provides users with a complete set of tools for monitoring the etch process and optimising process results.