Used AMAT / APPLIED MATERIALS P5000 MxP #181092 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 181092
Wafer Size: 8"
Vintage: 1997
Poly etch system, 8"
Specifications:
Wafer Diameter: 8"
Process: 42 Poly
Software Version: L4.70B
System Power Rating: 208 VAC 3-Phase
Loading Configuration: 2 Cassette Handler / 29-Slots Storage
ESC Type: Electrostatic
1Torr Manometer: MKS 127AA-00001B
Chamber Dry pump model and size: Ebara A70W
Loadlock Dry pump model and size: Ebara A10S (sharing between chamber A/B)
Turbo pump model and size: Seiko Seiki 301CB1
Turbo pump controller: SCU-21D
Cathode Chiller model: AMAT Neslab HX150
Wall Chiller model: AMAT Steelhead 1 CHX (sharing between chamber A/B)
EP system: Monochrometer
Heater Stack/Gate valve: Standard
RF generator model: ENI OEM-12B
RF match model: Hybrid RF Match
IHC manometer: 10 Torr Manometer
IHC mfc size: 20 sccm
High Voltage Module: Chuck
Process Configuration:
Chamber Position 1 / Etch Chamber A:
Chemicals/Gases used: CHF3 HBr NF3 O2 HeO2 CF4 Ar Cl2
Chamber Position 2 / Etch Chamber B:
Chemicals/Gases used: CHF3 HBr NF3 O2 HeO2 CF4 Ar Cl2
1997 vintage.
AMAT / APPLIED MATERIALS P5000 MxP is a high capacity plasma etch reactor, designed for use in the semiconductor fabrication industry. It is a single-wafer, high-density plasma (HDP) etch equipment, designed for maximum throughput and precision etching. AMAT P5000 MxP features a process chamber that is configured in a multi-stage configuration, which enables it to deliver the optimum etching profile for a variety of applications. The load-lock and transfer chamber provide high throughput while ensuring that the etch process is highly repeatable. The automated on-board gas handling system also provides consistent gas flow rate throughout the etching process, while two plasma sources allow for high-fidelity etching. The powerful source power coupled with the effective closed-loop flow control unit provides a reliable etching process that produces the desired results consistently and accurately. The large wafer size (up to a 10" wafer) enhances the throughput and makes APPLIED MATERIALS P5000 MxP cost-effective for large-scale production. The automated process control and monitoring machine also helps to ensure a safe etching process. The tool can be used for etching of a wide range of materials, from metals to dielectric films. Additionally, it is suitable for etching of MOSFETs, BJTs, and MEMS devices. It is also designed to ensure that parts are etched without damage due to over-etching or under-etching. To ensure reliable operations, P5000 MxP is equipped with diagnostics to monitor the performance of the tool. It also includes a supply of spare parts and safety interlocks in order to protect the tool and its operation in the event of unexpected failure. Overall, AMAT / APPLIED MATERIALS P5000 MxP is an efficient, reliable, and cost-effective plasma etch reactor, ideal for production of a variety of semiconductor components and other delicate materials. It offers a high level of process control and high throughput, while its automated control tool helps ensure that the etching process is performed safely and effectively.
There are no reviews yet