Used AMAT / APPLIED MATERIALS P5000 MxP+ #185395 for sale

Name: AMAT / APPLIED MATERIALS P5000 MxP+
Brand: AMAT / APPLIED MATERIALS
SKU: 185395
Availability: SoldOut

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Manufacturer

AMAT / APPLIED MATERIALS

Model

P5000 MxP+

ID: 185395

Wafer Size: 8"

Vintage: 1994

Oxide etch system, 8" (2) Chambers Software Revision SBC Board Version V21 Mainframe cables Standard / Extended (length) STD Chamber Location A / B / C / D: A/B Safety Module EMO Switch(2): Present UPS & Power Vaccine Remote Frame Pump Control Interface: Present Circuit Breaker: Present EMO Switch: Present Expanded VME Monitor Rack CRT Monitor: Absent Light Pen: Absent Service Monitor Rack: Absent Miscellaneous Harddisk: Present Floppy Disk: Present Transformer: Present Gas Panel standard / Extended: Expanded Laminar Flow Hood Mainframe cover: Absent Loadlock Chamber Robot Type Phase III Robot: Phase III Type Robot Blade: 8 Inch Blade WPS: Installed TC Gauge: Installed ATM Switch: Installed Vacuum Switch: Installed Blade Chuck Vent Kit: Absent Vacuum Sensor(TC): Installed Storage Elv. Slots 8 or 29: 29 Wafer IO Sensor Present or Not: OK Electronics (BD) System Electronics TC guage boards(2): Installed +12 Vdc powersupply: Installed +15 Vdc powersupply: Installed -15 Vdc powersupply: Installed Buffer I/O board: Installed AI Mux board(1): Installed Optical sensor boards(*2ea): Installed Chopper driver boards (*4ea): Installed Pneumatic Control PCB: Installed Main DC Power Supply: Installed ESC Controller Board: Installed Chamber A CVD: OXIDE Chamber Type: MXP+ RF Match Box 0100-30686 Nv Module cesc: Yes Epd controller: Yes Gate valve: Yes Cap manometer 1: Mks 1Torr TC Gauge: Yes Isolation V/V: STD Throttle V/V Type: STD Slit V/V: STD Turbo pump: SEIKOSEIKI STP301CVB Turbo pump Controller: YES Chamber B: CVD: OXIDE Chamber Type: MXP+ RF Match Box 0100-30686 Nv Module cesc: Yes Epd controller: Yes Gate valve: Yes Cap manometer 1: Mks 1Torr TC Gauge: Yes Isolation V/V: STD Throttle V/V Type: STD Slit V/V: STD Endpoint module: Monocromator Turbo pump: SEIKOSEIKI STP301CVB Turbo pump Controller: YES Gas Interface PCB: Gas Panel Interface/Expanded Gas Panel PCB Solenoide V/V Module: STD/Expanded Air V/V: FUJIKIN Gas box A,B MFC UNIT - 8160: CHF3 100SCCM MFC UNIT - 8160: AR 200SCCM MFC UNIT - 8160: CF 50SCCM MFC UNIT - 8160: O2 10SCCM MFC UNIT - 8160: N2 100SCCM.

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AMAT / APPLIED MATERIALS P5000 MxP+ is a multipurpose field-usable chemical vapor deposition (CVD) equipment designed for research and development into advanced material structures and devices. This system is suitable for a variety of R&D applications, such as compound semiconductors, nanomaterials, superlattice devices, single-walled carbon nanotubes, nanowires, and other two-dimensional layered materials. AMAT P5000 MxP+ includes two chambers with a vacuum control unit and a specialized data acquisition module. The chamber is designed to offer excellent quality and consistent performance over a wide range of temperature and pressure settings. With a low profile and ergonomic design, APPLIED MATERIALS P5000 MxP+ features an intuitive user interface that allows for easy and efficient setup. The CVD process at this machine is based on the principle of bubbling reactive gas molecules to a substrate at pressure and temperature. The substrates are heated to a pre-determined temperature and the reaction gas is brought into the chamber. A controlled mixture of several gases is then injected into the reaction chamber where it provides a controlled chemical environment for the surface reaction. The CVD process is monitored in real time and an automated tool is used to control the gas rate, temperature, and pressure inside the chamber. P5000 MxP+ includes an advanced CVD temperature control asset to provide highly annealed films with excellent uniformity of thickness. It is also equipped with a multiplexing capability, allowing CVD processes to be optimized in 8 parallel pathways. The dual chamber design adds flexibility, enabling the model to simultaneously perform CVD deposition, oxide remove, and other processing. To ensure a reliable and repeatable deposition process, AMAT / APPLIED MATERIALS P5000 MxP+ features a monitoring and control equipment with built-in safety features, such as overpressure protection, temperature sensor duration control, and reaction chamber temperature alarm. This system is also able to continuously monitor samples, detect any changes in qualities, and adjust operational parameters accordingly. AMAT P5000 MxP+ is a powerful and reliable CVD unit for advanced material research and development. It offers excellent performance, flexibility, and accuracy in R&D applications. This machine provides an advanced CVD temperature control tool, multiplexing capability, and reliable monitoring and control features that ensure a consistent and reliable deposition process.