Used AMAT / APPLIED MATERIALS P5000 MxP+ #197312 for sale

AMAT / APPLIED MATERIALS P5000 MxP+
ID: 197312
Wafer Size: 8"
Oxide system, 8" (3) Chambers.
AMAT / APPLIED MATERIALS P5000 MxP+ is an advanced-level reactor which is designed to make precise semiconductor components. It delivers impressive results, thanks to its unique combination of leading-edge process technologies, integrated tools and advanced materials analysis capabilities. AMAT P5000 MxP+ is the first equipment to combine both physical vapor deposition (PVD) and atomic layer deposition (ALD) in one platform. This flexibility enables faster, higher-yield processing with excellent overall process repeatability. APPLIED MATERIALS P5000 MxP+ utilizes state-of-the-art Thin Film Process (TFP) technology to ensure precise and repeatable control of deposition conditions. With TFP, the system will monitor a broad range of parameters, including temperature, pressure and gas flows in real-time. This advanced capability helps ensure that films are consistently generated with optimized performance. P5000 MxP+ also features a high-resolution optical microscope and CCD imaging to enable detailed process monitoring and feedback. Additionally, it supports advanced materials analysis tools such as X-Ray, Auger and SIMS to help characterize films at the atomic and molecular level. Additionally, AMAT / APPLIED MATERIALS P5000 MxP+ incorporates innovative engineering design features to improve unit reliability and efficiency. It includes a modular auto-changeover machine which automatically switches between PVD and ALD processes to minimize downtime. Furthermore, it features an integrated, standard temperature and pressure control section to ensure uniform operating conditions. AMAT P5000 MxP+ was designed to meet the highest standards of quality and performance. With its advanced technology, it is capable of producing complex films to the tightest tolerances, with minimal downtime and in a cost-effective manner.
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