Used AMAT / APPLIED MATERIALS P5000 MxP #293816535 for sale

AMAT / APPLIED MATERIALS P5000 MxP
ID: 293816535
Wafer Size: 6"-8"
Vintage: 1996
Etcher, 6"-8" (3) Chambers 1996 vintage.
AMAT / APPLIED MATERIALS P5000 MxP reactor is an advanced deposition solution that provides chemical vapor deposition (CVD) and physical vapor deposition (PVD) processes. The equipment utilizes high-capacity, low-pressure chambers to enable faster thin film deposition with improved control. It is widely used in the semiconductor industry for device fabrication, as well as other industries such as solar cell manufacturing, MEMS/NEMS device fabrication, sputtering, and ion beam etching. The system features five process pods with two reactor chambers. Both chambers are connected to a turbo molecular pumps and integrated mass flow controllers. Each pod operates independently, providing the flexibility to run various types of processes and recipes simultaneously. The unit provides the ability to rapidly change from one process to another in a matter of a few minutes. This helps users optimize their recipes for consistent, high-yield production runs. AMAT P5000 MxP reactor's process chambers utilize an advanced charge-coupled device (CCD) bead/wire feed machine to ensure accurate and repeatable deposition over the lifetime of the tool. This asset also utilizes a dry clearing tube feed option to create a clear, dry work zone. Both feed options have been tested to be low-particulate, low-vacuum, and are washable to extend the life of chamber components. The model's Auto-Tune controller is designed to continually take chamber temperature and pressure readings to automatically optimize deposition recipes. This helps maximize throughput and repeatability. APPLIED MATERIALS P5000 MxP also features an integrated data logger, which records equipment data and allows users to track the health of their system over time. This unit data is secured and stored on an encrypted local memory card, ensuring data integrity and privacy. In conclusion, P5000 MxP reactor is an advanced deposition solution that provides chemical vapor deposition (CVD) and physical vapor deposition (PVD) processes with increased throughput and repeatability. It's CCD bead/wire feed machine, coupled with its Auto-Tune controller, allows for excellent process results and smooth operation with minimal maintenance. The Encrypted local memory card allows for data integrity and privacy. The tool is widely used in the semiconductor industry for device fabrication, as well as other industries for similar applications.
There are no reviews yet