Used AMAT / APPLIED MATERIALS P5000 MxP #9037741 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9037741
Cluster tools with 2-chamber, 8"
General Information:
Cass nest: Plastic 8"
Wafer shape: SNNF (Semi notch no flat)
No SMIF Interface
System Information:
Software version: B4.70
Has SECS / GEM
Chamber Location / Type / Current Process:
Position A: MarkII / Oxide etch
Position B: MarkII / Oxide etch
Etch chamber:
Chamber type: MxP
Wafer clamp: Polyimide ESC
Has BS He Cooling
Has He dump line
Turbo pump: SEIKO STP-301CVB
Endpoint type: Stand alone
Monochrometer qty: Each per chamber
Generator model: CH-A:ENI OEM-12A CH-B:ENI OEM-12B-02
Max Power: 1250 w
Lid temp control: PID control
Gate valve: Heated gate valve
Matcher: SMA-1000
Process Manometer: MKS 1 Torr
Gas Panel:
Manual valve: On each line
Filter: On each line
Gas panel facilities hook up: Multi-line top feed
Exhaust: Top
Has gas panel door interlock
Has gas panel exhaust interlock
Has gas panel remote mini-controller
Gas Panel Pallet:
MFC type: 8-lines per chamber
Gas line (gas name, MFC size): STEC SEC-4400MC / STEC SEC-Z512MGX
Chamber A:
Line 1: CHF3/100/SEC-4400
Line 2: O2/40/SEC-4400
Line 3: CH2F2/30/SEC-4400
Line 4: CF4/100/SEC-4400
Line 5: NF3/100/SEC-Z512MGX
Line 6: HBr/200/SEC-4400
Line 7 (remote): CI2/50/40/SEC-4400
Line 8 (remote): Ar/100/40/SEC-4400
Chamber B:
Line 1: CHF3/100/SEC-4400
Line 2: O2/40/SEC-4400
Line 3: CH2F2/30/SEC-4400
Line 4: CF4/100/SEC-4400
Line 5: NF3/100/SEC-Z512MGX
Line 6: HBr/200/SEC-4400
Line 7 (remote): CI2/50/40/SEC-4400
Line 8 (remote): Ar/100/40/SEC-4400
Mainframe:
Loadlock type: 29-slot
Has cassette present sensor
Robot type: DRIVE, ROBOT P 5000 WKIT
EMO Button: Front, side
Has water leak button
Signal tower (front): Green, yellow, red
Remotes:
Line frequency and voltage: 50 / 60 Hz, 3 Ph, 208 VAC
Remote UPS interface: 1 Ph, 120 V
System monitor display / conntroller: In front
Has EMO button
Has smoke detector
Has water leak detector
Heat Exchanger type:
For wall: AMAT-0 x1
For cathode: NESLAB HX-150 x1
Pumps Type:
LL Chamber: EBARA A10S (not included in scope)
Chamber A: EBARA A30W (not included in scope)
Chamber B: EBARA A30W (not included in scope)
1993 vintage.
AMAT / APPLIED MATERIALS P5000 MxP Reactorm is a cost-effective, mass-volume tool for process technology development. The reactor is capable of producing a wide variety of advanced materials, including ceramics and metals, at high efficiency with low cost. The reactor's core feature is its modular design, which enables it to be customized for different applications and processes. AMAT P5000 MxP reactor is designed to provide users with optimal levels of temperature, pressure and composition control while also allowing for material reaction flexibility. The reactor is capable of handling temperatures up to 500°C and pressures up to 5 bar. It has top and bottom ports for inlet and outlet of gas, with special aeration systems for better air circulation. The reactor also features adjustable heating zones to facilitate precise control over temperatures and reaction parameters. APPLIED MATERIALS P5000 MxP reactor's modular design allows for easy addition of hardware and software, enabling optimal process routeing. The reactor can be integrated with a variety of sensors, pumps and other components necessary for efficient mass-volume production. Additionally, the reactor is designed with several control and monitoring systems, including computer-controlled reactions, automated data collection and analysis. In order to maximize the performance of P5000 MxP reactor, the reactor is often coupled with secondary processors such as electrochemical cells, vapor deposition chambers and plasma etching units. The reactor also features an extensive library of materials templates, enabling quick switching of desired end product. This is particularly advantageous when used in conjunction with process technologies such as chemical vapor deposition, sputtering and reactive ion etching. Overall, AMAT / APPLIED MATERIALS P5000 MxP reactor is a reliable and cost-effective tool for advanced material development and manufacturing. The reactor's modular design and wide variety of features enable users to adjust and expand the system for their specific application, with features such as precise temperature and compositional control enabling better process control, improved product quality and greater versatility.
There are no reviews yet