Used AMAT / APPLIED MATERIALS P5000 MxP #9102226 for sale

AMAT / APPLIED MATERIALS P5000 MxP Reactor is a next-generation, high-performance production-grade equipment designed for processing a variety of thin-film deposition processes including Atomic Layer Deposition (ALD), Physical Vapor Deposition (PVD), and Rapid Thermal Processing (RTP). This reactor is an improved version of the P5000 series, providing high-efficiency and quality reactions for more reliable results. AMAT P5000 MxP Reactor features a high-speed, high-resolution hydraulic system, allowing for precise and controlled movement of multiple components with minimal drift. This unit can operate at a pressure up to 500 mbar, with a maximum temperature of 1100°C, while accurately controlling the reaction conditions. The integral uniformity machine helps maintain a consistent process across the entire reactor. It features a target chamber that allows for direct adjustment of the volumes and gas flow required for the reaction. The reactor also incorporates an embedded source monitoring tool which enables users to monitor the status of each source while the reactor is in operation. A range of software-based features, such as real-time temperature control, allow users to optimize their process conditions to improve reaction results. For increased safety during operation, the device is also equipped with emergency switch offs and an inert gas leak detector. APPLIED MATERIALS P5000 MxP Reactor is a modular asset, allowing for easy installation and rapid tool change. It comes with a range of easily replaceable and serviceable parts, allowing for easy maintenance and improved uptime. An intuitive Interactive GUI helps facilitate easy, efficient operation from one integrated interface. Overall, P5000 MxP Reactor is a powerful production-grade model that can reliably and efficiently handle thin-film deposition processes. It is suitable for use in a range of industrial applications, providing users with production-grade quality and reliable performance.