Used AMAT / APPLIED MATERIALS P5000 MxP #9127952 for sale

AMAT / APPLIED MATERIALS P5000 MxP Reactor is a versatile and powerful processing tool used in the semiconductor industry. This advanced machine is designed to transfer chemical vapors onto substrates, enabling advanced semiconductor fabrication processes. AMAT P5000 MxP Reactor is equipped with an advanced and powerful plasma generator, which features an integrated active microwire array and a powerful 63 MHz radio frequency (RF) generator. This combination provides the ability to precisely control etching and deposition processes over a large range of substrate sizes. For deposition, APPLIED MATERIALS P5000 MxP Reactor utilizes advanced high-density plasma (HDP) techniques to deposit single-layer or multilayer films with excellent uniformity, step coverage, and vertical profiles. This versatile reactor works with a variety of substrates and film materials, allowing for a wide range of films to be precisely deposited. For etching, P5000 MxP Reactor uses a unique magnetic mode to enable precision control over etch chemistry and etch rate. This power process eliminates the need for complicated external bias systems as magnetic mode etching provides improved vertical etch profiles and improved die uniformity. AMAT / APPLIED MATERIALS P5000 MxP Reactor offers flexibility and versatility with its process modules. The modules are designed to enable parallel processing with both etch and deposition processes, providing improved process throughput. The modular design also enables the user to combine processes with AMAT P5000 MxP, allowing for innovative process steps to be available on a single platform. Additionally, APPLIED MATERIALS P5000 MxP Reactor makes use of an extensive range of substrates and substrate materials. These include single- and double-sided substrates in a range of diameters from 2 inches up to 8 inches. Furthermore, P5000 MxP Reactor also supports various substrate materials, including but not limited to silica, aluminum nitride, and silicon nitride. AMAT / APPLIED MATERIALS P5000 MxP Reactor is a powerful and versatile process tool for semiconductor fabrication processes. Its unique capabilities, such as high-density plasma deposition and magnetic mode etching, provide precise control over etch and deposition chemistry and the ability to process a wide range of substrates and film materials. As a result, AMAT P5000 MxP Reactor can provide the necessary process flexibility and throughput required for today's advanced semiconductor fabrication processes.