Used AMAT / APPLIED MATERIALS P5000 MxP+ #9177952 for sale

Name: AMAT / APPLIED MATERIALS P5000 MxP+
Brand: AMAT / APPLIED MATERIALS
SKU: 9177952
Availability: SoldOut

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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

P5000 MxP+

ID: 9177952

Wafer Size: 8"

Vintage: 1993

System, 8" Chamber type Process Ch-A: Mxp Metal etch Ch-B: MxP Metal etch Ch-C: ASP P/R Strip Process kit Manometer Ch-A: Metal STD 1 Torr/MKS Ch-B: Metal STD 1 Torr/MKS Ch-C: Qtz 10 Torr/MKS Clean method Throttle valve Ch-A: RF Clean Yes Ch-B: RF Clean Yes Ch-C: - Yes Turbo pump Magnet driver Ch-A: Yes Yes Ch-B: Yes Yes Gas box MFC Gas name Ch-A: Yes - Ch-B: Yes - Ch-C: Yes - VME Type: HDD: Yes Controller slot: (21) Slots SBC Board type: SV21 Synagy Boss rom ver: Boss 4.8 Video board type: VGA Video FDD: 3.5" Robot type: Phase III Cassette handler: Phase III (top clamp) Sto elevator type: (8) Slots I/O Wafer sensor: Yes WPS Sensor: Yes L/Lock slow vent: Yes Slit valve type: Standard L/Lock purge: Yes RF Gen I/II type RF Match Ch-A: OEM 12A Phase VI Ch-B: OEM 12A Phase VI Ch-C: AX2115 Manual match EPD: E2.8 Exhaust line: Top, standard EPD Method: Monocrometer Gas panel: (12) Gas lines Monitor: TTW Mini controller: No H/E: AMAT 0 Chiller: NESLAB 1993 vintage.

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AMAT / APPLIED MATERIALS P5000 MxP+ is a reactor designed to provide advanced high performance thin film deposition for the production of high quality, cutting-edge semiconductor products. This tool utilizes a high-vacuum and in-situ temperature sensing capabilities to achieve deposition and processing. AMAT P5000 MxP+ can be used for a variety of deposition techniques, such as CVD, MOCVD, and ALD. APPLIED MATERIALS P5000 MxP+ is designed with a vacuum chamber that is sealed using high-precision linear bearings, and a high-force indirect controlled pumping equipment. This design ensures a robust and reliable vacuum quality, with a maximum chamber pressure of 1.33 x 10- 4 Torr. The reactor also has a high temperature operating range, with temperatures up to 1000°C. This allows the deposition of high-quality and high-performance architectures. The system also features an advanced in-situ diagnostic unit that provides reliable real-time monitoring of the deposition process. This powerful machine allows for automated process development of both continuity and uniformity. This is a great advantage for any customer wanting to optimize the deposition process. P5000 MxP+ has also been designed with integrated safety features that prevent any dangerous conditions from occurring. This includes laser interlock, process interlock, and RF shielding. The interlock tool also monitors the process to ensure that the chamber parameters remain below the set-point values. In addition, AMAT / APPLIED MATERIALS P5000 MxP+ provides a customizable, integrated automation software that allows for the customization of the process logic and the asset configuration. This software has an excellent user-friendly interface and provides control over the reactor without the need for any external programming skills. Overall, AMAT P5000 MxP+ is a highly advanced and robust reactor model ideal for developing cutting-edge semiconductor products. With its high-vacuum capabilities, integrated temperature sensing, in-situ diagnostic equipment, and various safety measures, this system provides customers with the superior quality they want in their products.