Used AMAT / APPLIED MATERIALS P5000 MxP #9218919 for sale

AMAT / APPLIED MATERIALS P5000 MxP is a reactor designed for plasma-based etching and deposition applications. It features a flexible, wide-gap RF source and integrated Faraday shield that permit operation over a wide range of frequencies, pressures, and loading configurations. The unit offers independently adjustable gas lines for precise control of etchant and dopant gases and employs an integrated vacuum pumping system for precise chamber pressure control. It also offers a comprehensive set of plasma diagnostics, including a Langmuir Probe, optical emission spectroscopy, online wafer mapping, and plasma-based source power frequency spectroscopy. All necessary compatibility upgrades, including computer equipment, on-site servicing, and spare parts are available from the company. AMAT P5000 MxP is designed for both traditional etch and deposition processes as well as more advanced plasma processes like atomic layer deposition and ion implantation. The flexible configuration of the unit enables the etching and deposition of a wide range of materials, including oxides, nitrides, dielectrics, and metals. Its large chamber size and spatial homogeneity make APPLIED MATERIALS P5000 MxP suitable for a number of processes, including high-rate deposition and fine-tuned etching operations. P5000 MxP is designed as a turnkey process system and comes fully equipped for operation. It includes an integrated mission processor that handles automated process recipes, setting up and managing the plasma parameters and wafer loading. Additionally, it offers process monitoring and diagnostics tools to ensure the highest possible uniformity and yields. The plasma power source can be adjusted to a range of frequencies, pressures, and simple and complex loadings, effectively covering a wide range of materials and processing recipes. AMAT / APPLIED MATERIALS P5000 MxP is engineered to offer reliable plasma etching and deposition performance with consistent long-term process stability and yield rates. The unit can be easily configured, maintained and serviced as it comes fully equipped with all necessary accessories, software and maintenance tools. Furthermore, its integrated plasma and wafer mapping diagnostics technologies ensure the highest possible yield and process uniformity over large areas. In summary, AMAT P5000 MxP is a large-capacity process system designed for plasma-based etching and deposition processes compatible with a wide range of materials. Its robust design and integrated diagnostics technologies make it ideal for operations involving high-rate deposition, fine-tuned etching and atomic layer deposition.