Used AMAT / APPLIED MATERIALS P5000 MxP #9218922 for sale

AMAT / APPLIED MATERIALS P5000 MxP
ID: 9218922
Wafer Size: 6"
Metal etch system, 6" (2) Chambers.
AMAT (APPLIED MATERIALS) AMAT / APPLIED MATERIALS P5000 MxP is a state-of-the-art plasma reactor designed to provide high end plasma processing in a range of semiconductor, display, fuel cell and MEMS applications. This reactor is designed for maximum flexibility and throughput in both production and research environments. AMAT P5000 MxP is capable of delivering plasma created from a variety of process gases, including hydrogen, nitrogen, and oxygen. It also offers a maximum temperature range of 750 - 1000°C, with temperature control options including pulsing and quad-zone operation. In addition, the reactor can be outfitted with an array of diagnostic and sample-handling components, enabling use in real-time plasma measurements. The reactor features proprietary hardware and software systems which allow for the delivery of highly reliable, repeatable processes. This includes precision deposition and etch treatments, rapid thermal processes, rapid prototyping, and precision mask alignment and adjustment. The control architecture features in-situ sensor feedback control, ultra-fast gas mixing, and real-time spectral analysis. APPLIED MATERIALS P5000 MxP offers a number of automated process functions including automatic chamber cleaning, wafer loading/unloading, and multiple recipe execution. This reactor also provides extended data collection capability for process monitoring and results reporting. Furthermore, the tool is designed for high repeatability, with low-maintenance access to parts and components for ease of servicing and reduced downtime. In summary, P5000 MxP is a powerful and versatile reactor designed for the latest in plasma processing needs. It offers an array of automated process functions and powerful hardware and software systems, enabling users to realize repeatable, reliable processes with minimal downtime.
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