Used AMAT / APPLIED MATERIALS P5000 MxP #9226621 for sale

AMAT / APPLIED MATERIALS P5000 MxP is a metal patterning reactor designed for use in photolithographic processes of semiconductor device manufacture. The reactor takes advantage of latest innovations in plasma etch and deposition systems to deliver superior results in the production of high aspect ratio and uniform metal structures. The reactor offers a choice of two plasma source types - inductively coupled plasma (ICP) and capacitively coupled plasma (CCP) - to enable users to select the best etching process for their specific application. It also uses a titanium sublimation source that enables etching patterning of structured layered hard masks. AMAT P5000 MxP features patented RF Matching Technology to provide the best possible plasma process control and repeatability. The reactor is also equipped with advanced plasma uniformity and endpoint detection capabilities to enhance the process window and enable precise and repeatable results. The reactor's Innovative Reticle Kit also allows users to make use of different mask sizes, shapes, and line widths, as well as make use of features such as blind vias, trenches, and leveled features. Advanced features of the reactor include a chemical-mechanical polishing (CMP) capability that ensures precise contact patterning and etch depth, an automated reticle transfer system, and a gas coalescing system that ensures uniform gas delivery. The reactor is also equipped with other user-friendly features, including a simple user interface and graphical color displays, to ensure that its use is easy, intuitive, and efficient. In conclusion, APPLIED MATERIALS P5000 MxP is a state-of-the-art production reactor that has been designed to deliver laser-sharp performance in the production of complex structures. Its unique combination of advanced plasma sources, process control and uniformity capabilities, and user-friendly features make it a versatile, cost-effective solution for device manufacturing.