Used AMAT / APPLIED MATERIALS P5000 TEOS #293824836 for sale

AMAT / APPLIED MATERIALS P5000 TEOS is a state-of-the-art, high-throughput reactor equipment used for growing thin films for a wide range of applications. The system is designed for applications involving slicing, etching, and deposition of materials including silicon, silicon dioxide, metal nitrides, metal oxides, and other dielectric materials. AMAT P5000 TEOS is equipped with an electron cyclotron resonance (ECR) plasma source, directionally plasma assist etching, and direct liquid injection (DLI) technologies. The ECR plasma source is used to create a highly-ionized plasma environment with a wide range of plasma parameters. The directionally plasma assist etching is used to provide precise etching of materials at the surface of the substrate being processed. This allows for precise etching and high-rate deposition of films. The DLI technology, which is a variation of chemical vapor deposition (CVD), is used to rapidly deposit films that are uniform in thickness, composition and structure. The unit has a modular chamber design and can be combined with a range of other chamber configurations for specific applications. It utilizes an advanced robot motion and wafer transport machine to ensure high throughput and minimize manual intervention and errors. The tool is also equipped with sophisticated temperature control and monitoring systems. Overall, APPLIED MATERIALS P5000 TEOS is a versatile, high-throughput, and advanced reactor asset designed for thin film deposition and etching. It is capable of providing precise etching, high rate deposition and uniform films with excellent yield. The advanced control systems and automated process control ensure that excellent films can be grown with repeatable and reliable results.