Used AMAT / APPLIED MATERIALS P5000 WCVD #9289562 for sale

AMAT / APPLIED MATERIALS P5000 WCVD (Chemical Vapor Deposition) Reactor is a versatile, high throughput, metal-enhanced ultra-high vacuum deposition system. This advanced tool offers a host of features that make it a useful tool for many different applications. AMAT P5000 WCVD Reactor provides high throughput deposition rates at the fastest deposition times with its automated film growth features. Users can choose from single, multiple, or tailoring zones with up to four wafer schedules for precise, repeatable film growth. The P5000 also supports a range of deposition capabilities, including etching, metal-enhanced deposition (including tantalum nitride, titanium nitride, and tungsten carbide), and conformal deposition for materials like silicon nitride and aluminum oxide. APPLIED MATERIALS P 5000 WCVD Reactor also includes a wide range of capabilities for post-processing, including capillary cleaning for nanomanufacturing and low-temperature annealing for producing contact-free surfaces. This can make it a great tool for manufacturing semiconductors and ICs. Additionally, P5000 WCVD Reactor is designed with a robust, user-friendly control interface with touch screen technology. The system's intuitive user interface makes it easy to navigate and operate, even for inexperienced users. Users can also transfer history files, access remote communications, and set process conditions via one secure, convenient connection. The P5000 also incorporates advanced diagnostic capabilities, which allow for predictive maintenance and process optimization. AMAT P 5000 WCVD Reactor is ideal for those requiring the most recent deposition technologies in their process. This advanced deposition tool provides excellent deposition rates and fast deposition times, making it an ideal choice for high purity films, high aspect ratio features, and ultra-precise structures in high-performance micro-electronic components. From semiconductors and ICs to MEMS and photovoltaic applications, P 5000 WCVD Reactor is an indispensable tool for those requiring the most efficient high-throughput deposition system available.