Used AMAT / APPLIED MATERIALS P5000 #115356 for sale

AMAT / APPLIED MATERIALS P5000 is a fully automated 300mm single-wafer reactor that provides precise low-pressure chemical vapor deposition (CVD) technology. This tool is made up of several components and sub-units, including an ambient chamber, a process chamber, a transfer chamber and a furnace. The ambient chamber is one of the major components of this reactor. It is sealed with a HEPA air filter, ensuring that the environment inside the reactor is clean. The chamber houses a high-speed robotic arm, which is then used to transfer the wafer to and from the transfer chamber, as well as providing precise control of the wafer's orientation. The process chamber is where the chemical vapor deposition (CVD) process takes place. This chamber is equipped with two CVD reactors, which use high temperatures and precise low pressures to deposit a thin layer of material onto the wafer. The temperature inside the process chamber can be precisely controlled and ensures uniform deposition across the entire wafer. The transfer chamber is a large vacuum-sealed chamber which houses the transfer robot that moves the wafer from the ambient chamber to the process chamber. This chamber is designed to ensure that the wafer remains safe and contamination-free during the transfer process. The furnace is a high-temperature oven which is used to bake the wafer before and after the CVD process. This heated oven helps improve the adherence of the deposited material on the wafer and also assists in uniform deposition. AMAT P-5000 also features an advanced computer-monitoring system, allowing for precise control and monitoring of the current parameters and temperature during deposition. This computer-monitoring system also allows users to store and retrieve recipes, as well as monitor internal and external temperatures. Overall, APPLIED MATERIALS P 5000 reactor is designed to perform precise low-pressure chemical vapor deposition (CVD) of materials on wafers with uniform deposition and uniform weight. This tool is equipped with several different components, including an ambient chamber, a process chamber, a transfer chamber and a furnace, which work together to ensure a clean, contamination-free environment for clean, precise deposition.