Used AMAT / APPLIED MATERIALS P5000 #115991 for sale
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ID: 115991
Wafer Size: 6"
Vintage: 1991
MXP Etcher, 6"
(3) Chambers
Mainframe type: Mark II
I/O Wafer sensor: No
Installation: Stand alone
Expanded VME: Yes
Mini-Controller: Yes
Phase 3 robot: Yes
Phase 3 cassette handler: Yes
Storage elevator: (8) Slots
Cassette platform: Standard
Wafer orienter: No
L/L Chamber bolt down lid: No
L/L Particle reduction kit: No
Gas panel:
MFC Unit UFC-1100A
Gas panel type:
Twelve lines main: No
Twenty-Eight line onboard: No
Standard gas panel (28 line capability): Yes
Remote gas panel: No
Chamber A:
MFC Size gas cal gas
300 sccm CF4 N2
100 sccm Ar N2
100 sccm O2$ O2
50 sccm O2 N2
Chamber C:
MFC Size gas cal gas
300 sccm CF4 N2
100 sccm Ar N2
100 sccm O2$ O2
50 sccm O2 N2
Chamber D:
MFC Size gas cal gas
300 sccm CF4 N2
100 sccm Ar N2
100 sccm O2$ O2
50 sccm O2 N2
Process application:
Chamber A: Etch MxP
Chamber C: Etch MxP
Chamber D: Etch MxP
System electronics:
Slot # Description
1 Mini SBC
2 SBC
3 SEI
4 MIZER: No
5 AI
6 AO
7 Video
8 AO
9 AI
10 Stepper
11 Stepper
12 Stepper
13 Stepper
14 DI/DO
15 DI/DO
16 DI/DO
17 DI/DO
18 DI/DO: No
19 DI/DO: No
20 DIO: No
Floppy drive 3.5
Chambers A, C and D:
Chamber type (Specify Mark II, MxP+, CVD or other): MxP
Lid type (Specify STD, EGEC, BDEC, Uni-Lid or other): STD
Chamber rough line
Chamber airline
Chamber interconnect PCB
Heat exchanger QD fitting
NESLAB facilities plumbing
Slit valve assembly
Remington hinge slit valve
Backing pump circuit breaker
RF Generator power outlet
RF Generator circuit breaker
Magnet driver (If present, Rev#)
Lamp driver (If present, Rev#): No
RF Match
Turbo controller
Turbo flow meter: No
Turbo pump / Controller type Turbolink NT340M: Leybold
Gate valve: No
Chamber vent valve
Remote frame:
Primary pump frame: No
Secondary pump frame: No
Stacked remote frame: Yes
Stacked remote frame contents: AMAT (3) RF Generators
(1) Heat exchanger
Type of hose fittings: QDC
RF Generators:
Chamber A: ENI 12A
Chamber C: ENI 12A
Chamber D: ENI 12A
1991 vintage.
AMAT / APPLIED MATERIALS P5000 is a state-of-the-art plasma-based reactor used for etching and depositing materials for the fabrication of electronic devices. This reactor is renowned for its cost-effective and high-performance capabilities. The reactor utilizes a high-density plasma equipment created from high-frequency electric fields that can provide precision etching and deposition. Through this process, features with extremely high precision can be accurately fabricated. In addition, AMAT P-5000 is also equipped with a specialized high-temperature subsystem that permits higher deposition rates and conformal deposition, which helps to increase material uniformity and reduce deposition and etching time, markedly enhancing the efficiency of the process. APPLIED MATERIALS P 5000 reactor also provides dynamic gas control and homogeneous planarization by integrating an advanced high-density plasma system. This substantially provides superior uniformity in layers between 4-100 nm, with an accurate thickness uniformity of +/- 5%. This helps to precisely control the etch rate and attain consistent selectivity at the deposition level. In addition, this unit has the capability of achieving up to 400 W of ion density and 40 mT of plasma uniformity, providing a superior etching process and including superior temperature control. In terms of throughput, AMAT P 5000 reactor is significantly faster than traditional reactor systems, with a maximum deposition rates up to 30 um/min. This helps to reduce the production time and cost. Furthermore, the machine incorporates a specialized computer interface, which enables the user to easily utilize different process parameters and recipes for the fabrication of different components. Overall, P-5000 is an advanced plasma-based reactor that provides cost-effective and high-performance capabilities for etching and depositing materials. This tool is renowned for its superior uniformity and accuracy with regards to thickness, ion density, and selectivity during deposition. In addition, its improved throughput and computer interface allows the user to easily fabricate components with specific requirements.
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