Used AMAT / APPLIED MATERIALS P5000 #116968 for sale

AMAT / APPLIED MATERIALS P5000 reactor is an epitaxial deposition and planarization equipment designed for advanced semiconductor device fabrication. AMAT P-5000 reactor provides a single-chamber solution that enables reliable and accurate deposition of epitaxial materials for a wide range of semiconductor applications. APPLIED MATERIALS P 5000 reactor is equipped with a 400mm susceptor platform featuring a 5-zone, multi-zone controller for precise temperature control. The substrate is heated by high-speed, independent electric susceptor coils located beneath the chamber lower surface. The susceptor platform is also designed to accommodate up to 24 wafers simultaneously. AMAT P 5000 reactor's patented Liner-Spring(TM) end-effector accommodates substrates of any type and size, eliminating the need to replace the end-effector to accommodate different substrates. AMAT P5000 reactor also offers an easy user friendly programmable software and a number of features to enhance productivity, including automatic pressure regulation, fault monitoring, and flat-plate vacuum degas. The system is also built with an array of deposition sources, including one combination enrichment/element source and five elemental sources that can be configured to provide various types of deposition. APPLIED MATERIALS P5000 reactor also features advanced gas delivery components including a source gas mass flow controller (MFC), purged inlet and outlet gas streams, purge manifolds, and separate catalysts for each source. Additionally, P5000 reactor is equipped with a multi-stage turbomolecular pump unit configured to meet the demanding operating requirements of semiconductor device deposition. The machine is designed with a combination of advanced sources and a variety of advanced materials processing technology to ensure an ultra clean process atmosphere. AMAT / APPLIED MATERIALS P 5000 also comes with an extra chamber called the 'Air-Stream' chamber. This allows for an additional source for depositing advanced materials for device-processing with the highest possible throughput. The air stream allows for the recharging of sources directly in the chamber rather than outside of it and the gas lines to the reactor are easily purged due to the separate chamber design. P 5000 reactor provides complete tool integration that ensures the highest levels of reliability and control. An optional data logging asset allows additional data collection and analysis tools, while a preventive maintenance model ensures optimal equipment performance. P-5000 reactor is a versatile, reliable system for the fabrication of any advanced semiconductor device.