Used AMAT / APPLIED MATERIALS P5000 #159335 for sale

AMAT / APPLIED MATERIALS P5000 is a multi-shot vapor deposition reactor designed for use in semiconductor and optoelectronic production processes. This chamber is ideal for applications involving the deposition of thin films onto substrates. It utilizes electron-cyclotron resonance (ECR) plasma source technology to achieve uniform substrates with high deposition rates and excellent uniformity. Additionally, AMAT P-5000 reactor is designed to provide precise temperature control, allowing users to achieve uniform temperature between substrates, a requirement for consistent material properties. APPLIED MATERIALS P 5000 reactor is a single-wafer and multi-process module that comes equipped with ion beam enhanced (IBE), sputter deposition, and ECR plasma etch components. The presence of these features simplifies the combination of two-step processes, providing more flexibility to users. The ECR plasma source of AMAT P5000 is ideal for deposition processes performed at low temperatures and for processing sensitive, fragile substrates without inducing thermal damage. It offers users a combination of process-control attributes that include high deposition rates, low plasma densities, and precise controllability. In addition, the ECR plasma source's high uniformity and controllability makes it ideal for processes involving the deposition of thin films. The IBE source in P-5000 reactor works simultaneously with the ECR plasma source, allowing users to simultaneously deposit and etch. This enables users to complete their deposition and etch processes in one step, improving the entire process's productivity. AMAT P 5000 reactor can also be used for advanced sputtering deposition processes. Its sputtering process is effective for both linear and non-linear material deposition, and it is precisely contained within the chamber. The sputter deposition method is effective for creating layer thicknesses of ten nanometers or less, and it can also be used to create superior material uniformity. Finally, APPLIED MATERIALS P5000 reactor also comes equipped with a Multi-Process Module (MPM). The MPM module is designed to enable advanced deposition of thin films, such as transparent oxides and metals. Additionally, the MPM is capable of further decreasing substrate-to-substrate temperature variation, enabling the production of reliable and high-performance products. In summary, APPLIED MATERIALS P-5000 reactor is a highly functional and reliable device. Thanks to its ECR plasma source technology, its ability to achieve precise temperature control and its ability to combine multi-processes in a single step, AMAT / APPLIED MATERIALS P-5000 is ideal for a wide range of semiconductor and optoelectronic manufacturing tasks.