Used AMAT / APPLIED MATERIALS P5000 #159341 for sale

AMAT / APPLIED MATERIALS P5000 is a type of deposition reactor used in thin-film deposition processes. It utilizes multiple sources with different types of gases, such as argon and nitrogen, to create a thin-film layer that is deposited on a substrate. The equipment has a variable temperature chamber, allowing the substrate to be heated up to temperatures of up to 750°C. In addition, it also contains a quartz crystal monitor to measure the thin-film deposition process. AMAT P-5000 is useful in a variety of applications, as it can be used to produce thin-film layers such as oxides, nitrides and metals on various types of materials. It can be used to create thin films ranging from sub-micron to hundreds of nanometers in thickness. APPLIED MATERIALS P 5000 also allows for precise control over the deposition process, allowing users to obtain films of high uniformity and quality. The system can accommodate up to four sources, with each source capable of providing different types of gases. To ensure uniformity, APPLIED MATERIALS P5000 utilizes a computer pin-point control over each source, allowing users to adjust the gas flowing from each source and monitor the film deposition process. The sources can be heated using a resistive device, allowing users to fine tune the temperature of the substrate. The unit also provides a range of safety features, such as an automated sampling machine that can detect leaks or thermal runaway. It also offers dual electro-magnetic interlocks, which are designed to offer protection in the event of a power failure or an emergency stop. Additionally, it also has a range of alarms and shut down systems designed to ensure the safe operation of the process. Overall, AMAT P 5000 is an ideal deposition reactor for producing thin films on various substrates. It offers a range of features, from safety measures to precise temperature control, making it an invaluable tool for a variety of commercial and industrial applications.