Used AMAT / APPLIED MATERIALS P5000 #159348 for sale

ID: 159348
Frame, as pictured Missing parts Stored in a cleanroom.
AMAT / APPLIED MATERIALS P5000 is a state-of-the-art reactor built to provide creating high-performance films and structures. It is an ultra-high-density plasma (UDP) reactor 8-inch wafer platform that is capable of an optimized "clean" chemistry which enables advanced material processing, specifically for maximum high-quality materials from process to parts. By leveraging the latest in plasma research, AMAT P-5000 provides the user with superior deposition performance for their device fabrication purposes. APPLIED MATERIALS P 5000 was designed with a high-energy and symmetrical downstream plasma deposition process to provide exceptional uniformity and quality performance. The unit offers a flexible process chamber design, including automated cleaning, gas distribution and variable process gas amounts. This allows users to efficiently customize and control their process parameters. AMAT P 5000 features a load-leveling cassette which ensures the delicate products receive uniform temperature while in-situ during the process. The equipment also features a built-in inerting process which allows the user to reduce contamination events and ensure a clean, contamination-free environment. AMAT / APPLIED MATERIALS P 5000 employs dual, air-cooled, weld-on pumps for its powerful pressure-boosting capacity. The unit has an integrated controller for accurate control of process temperatures and partial pressures of process gases. P-5000 controller can automatically adjust the pressure, time and temperature setting to optimize the deposition process, enabling the user to achieve superior deposition results. P 5000 utilizes a low-energy ion plating (LEIP) process for optimal film structure and quality. The LEIP process employs a mechanism for uniform deposition of the film, resulting in improvements in deposition yield, uniformity, and film quality. The system includes multiple rapid-response gas mixtures to allow for more precise and accurate gas delivery, as well as an adjustable plasma grid. Overall, AMAT P5000 is an ideal choice for those looking for a reliable and user-friendly unit for their advanced material processing needs. With an advanced combination of design features, P5000 provides superior deposition performance with excellent controllability and flexibility. The robust machine allows users to confidently produce superior products with the precision and performance necessary to excel in today's changing markets.
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