Used AMAT / APPLIED MATERIALS P5000 #177998 for sale

AMAT / APPLIED MATERIALS P5000 reactor is an ultra-high vacuum deposition (UHVD) equipment designed for plasma-enhanced chemical vapor deposition (PECVD). It is a tool used in today's advanced semiconductor manufacturing, enabling the deposition of thin films for the production of semiconductors, displays, and other devices used in consumer products. This system provides exceptional performance in depositing dielectric and metallic films for a variety of applications. AMAT P-5000 reactor is designed for fast and efficient UHVD process capability, enabling users to deposit films with precise composition control, without impurities or conflict. It has excellent uniformity, step coverage, and thickness control, which are key features for today's complex electronic device production. This unit features an advanced internal optimization process to keep critical process parameters at optimal levels. It utilizes an efficient capacitance-coupled power unit to ensure uniform distribution of the power in order to facilitate high deposition rates. APPLIED MATERIALS P 5000 reactor features multiple field-type inductively-coupled plasma sources which are capable of delivering up to 1 watt of RF power. It also offers precise temperature control with a range between -150 and 600 degrees Celsius. This machine includes a built-in diagnostic temperature controller, which provides a precise measurement of the process temperatures. The user can also manually adjust the environment to tailor each film deposition. P 5000 reactor provides advanced safety features, including an automatic pressure regulator and an inert gas blanket. It is designed with remote alarms and an automatic shut down capability, which ensure the safe operation of the tool. P-5000 reactor offers exceptional versatility, as it is capable of depositing dielectrics, metals and nitrides, oxides, and polymers. It is well-suited for the deposition of photoresist, and for the manufacture of semiconductor devices. This asset is also suitable for depositing platinum metals, which are essential in wire and contact processes. Overall, P5000 reactor is an advanced and reliable model that offers superior process control and performance. Its exceptional features and capabilities make it an ideal tool for today's complex applications.