Used AMAT / APPLIED MATERIALS P5000 #188546 for sale

AMAT / APPLIED MATERIALS P5000 is a reactor specifically designed for semiconductor and photovoltaic device production. It is a reactive ion etching (RIE) and sputtering process equipment, capable of working with a wide range of materials. AMAT P-5000 reactor consists of a vacuum chamber, an etch gas distribution manifold, a gas matching system, and the control and metrology equipment. The chamber is constructed with stainless steel walls, and the interior is made of a non-metallic material with high thermal stability. The etch gas distribution manifold is fitted with a series of valves and nozzles to facilitate precise etching. APPLIED MATERIALS P 5000 reactor is capable of operating under high and low-pressure conditions, with a maximum pressure range of 1-10 Torr. Temperature control is achieved through thermocouples, while a mass flow controller manages the precise chemistry of the etch process. The unit allows for quick reactor parameter adjustment and precise control over the etch process. AMAT P 5000 reactor is equipped with a digital control machine for improved accuracy, allowing for precise control over the etching process. The tool is capable of delivering high rates of removal, due to its advanced gas mixing asset, which provides a precise, uniform gas flow throughout the reaction chamber. The model also features a plasma generator that can produce highly reactive oxygen and nitrogen plasma. This provides advanced etch rate control, allowing for precise removal of features as small as 0.5 um. P5000 reactor is capable of working with a variety of materials, including metals, silicon, germanium, and polyimides. Its powerful ion etching allows for the fine-tuning of the etch process, allowing for precise flux control and feature width control. The equipment offers a choice of etch gases, allowing for the precise selection of etch species, with etch speeds that range from 0.3 microns to 50 microns, depending on the application. AMAT / APPLIED MATERIALS P-5000 reactor offers a high level of process stability, through its advanced temperature, pressure, and etch gas control. In addition, its digital control system allows for accurate etch process control and data logging. The unit is designed for easy access to all operational parameters, including temperature, pressure, and flow. This ensures easy variation of these parameters during the etching process. The machine is also capable of monitoring a variety of parameters, allowing for accurate etch process reproducibility. AMAT / APPLIED MATERIALS P 5000 reactor is an ideal tool for high-precision, high-quality production of photovoltaic and semiconductor devices.