Used AMAT / APPLIED MATERIALS P5000 #188548 for sale

AMAT (APPLIED MATERIALS) AMAT / APPLIED MATERIALS P5000 is a hostile environment single wafer reactor designed specifically for advanced manufacturing processes. This advanced processing equipment provides extreme temperature and pressure control, allowing users to target deposition and etch processes with precision in both high and low pressure environments. AMAT P-5000's temperature range spans from 350 degrees Celsius to 2000 degrees Celsius, and pressure range from 1 Torr to several hundred Torr, allowing for processing of a wide variety of materials such as polysilicon, oxides, nitrides, metals, and alloys. APPLIED MATERIALS P 5000 reactor is outfitted with several technologies that aid in precise processing, including diffusion barriers, ion sources, and coated exhaust plates. The diffusion barriers are made from Inconel and Hastelloy, which make them resistant to thermal shock, corrosion, and oxidation, and aid in preventing mixing of the gases inside the chamber. The ion sources used in AMAT P5000 are designed to produce various types of ions, be it photo, hydride, pulsed, hot, or hollow cathode, depending on the material that needs to be processed. The exhaust plates on AMAT / APPLIED MATERIALS P-5000 are coated with SiC material to prevent backside reaction with the substrate material, which helps reduce contamination inside the reactor chamber and protects the quality of processed materials. APPLIED MATERIALS P5000 also features a wide range of advanced automation capabilities, including wafer handling systems, automated calibration, and storage and control of recipe files. The wafer handing system allows users to precisely move the wafers in and out of the process chamber. The automated calibration processes can reduce run-time cycles and optimize process accuracy. Lastly, the recipe files can store up to 250 recipes, providing consistent repeatability and allowing users to quickly resume interrupted processes. Overall, P5000 provides high-precision controlling and processing capabilities for a wide spectrum of material types. Advanced features such as automated calibration, manual and highly accurate wafer handling, and its extensive temperature and pressure range make P-5000 the ideal reactor for advanced manufacturing processes.