Used AMAT / APPLIED MATERIALS P5000 #191829 for sale

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ID: 191829
Wafer Size: 6"
SiN systems, 6" (3) chambers.
AMAT / APPLIED MATERIALS P5000 reactor is a reliable and versatile type of reactor used in the semiconductor industry. AMAT P-5000 is a vertical, single-wafer thermal processing equipment with a large processing area. The reactor consists of a highly specialized vacuum system and gas delivery unit, a temperature-controlled process chamber, and powerful wafer handling machine. The vacuum tool of APPLIED MATERIALS P 5000 is designed to reduce particle counts and ensure a clean environment. It consists of a convection vacuum asset, turbo-molecular pumps, gate and specialty valves, and a set of filters to maintain low contamination levels. The vacuum model has the function of extracting unwanted particles and maintaining a clean atmosphere within the process chamber. The gas delivery equipment of P-5000 features an active-backside cost-of-ownership (CO2) post-riser manifold and a low-power, thermal-efficient nozzle. The CO2 post-riser helps manage gas delivery directly to the wafer surface. The low-power, thermal-efficient nozzle is designed to reduce the bubble formation in the process chamber, ensuring accuracy and repeatability during the process. The process chamber is equipped with temperature-controlled elements to ensure precise temperature regulation. It also has an advanced nitrogen/argon purging system to maintain a low gas pressure. The reactor has the capability to process up to 4 inch (10 cm) wafers. The wafer handling unit of P 5000 consists of 3-way robot loading and unloading, cassette-to-cassette ultrasonic cleaning, and a contactless atmospheric transfer machine. The robot loading and unloading tool is designed for efficient and repeatable handling of multiple wafers without contact with the process chamber. The cassette-to-cassette ultrasonic cleaning asset uses low-frequency, low-pressure cleaning to clean and inspect wafers, improve yields, and increase repeatability. AMAT P5000 is an efficient, reliable and versatile reactor used in the semiconductor industry. It offers a high-efficiency thermal process, advanced gas delivery capability, precision temperature control, and accurate cycle time management. APPLIED MATERIALS P5000 ensures repeatable processing, clean vacuum environment, and efficient delivery of the reactive gases.
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