Used AMAT / APPLIED MATERIALS P5000 #192914 for sale

AMAT / APPLIED MATERIALS P5000 is a highly efficient and flexible plasma chemical vapor deposition (CVD) reactor that is used in the manufacture of microelectronic components. This system offers RF, DC or pulse plasma deposition in a reliable platform for direct deposition on a wide variety of substrates, structures and configurations. AMAT P-5000 reactor utilizes electron cyclotron resonance (ECR) plasma technology and is capable of generating high-energy, 40 megawatt (MW) ECR discharges. In addition, APPLIED MATERIALS P 5000 is available with a heated differential pump system, providing independent stirring, programmable rates of chamber pressure, and ensuring uniform flow and uniform deposition throughout. APPLIED MATERIALS P5000 reactor operates in a closed loop configuration, combining reactive gases with plasma power to create a vacuum process chamber that is continuously evacuated by a pumped-down pressure. This environment allows for precise control of process parameters such as pressure, power density, and temperature, ensuring both repeatability and reproducible results. Furthermore, APPLIED MATERIALS P-5000's integrated computer control features allow for the real time monitoring and adjustment of operating temperature and pressure within the chamber to ensure optimal reaction conditions thus improving process control and reducing run times. The process materials used in P-5000 are provided in a variety of shapes, including wafers, substrates, and particles, and can range from a few nm to multiple mm in size. As a result, AMAT / APPLIED MATERIALS P-5000 reactor has a multi-purpose capability that provides deposition that is suitable for a virtually any type of ceramic structure. AMAT P5000 reactor is designed to be user-friendly and to meet target deposition levels for a number of applications such as high density memories, complex optical networks and micro-electrical circuitry. The rigorous design ensures excellent uniformity and process repeatability to guarantee quality and reliability as well as efficient use of resources. Moreover, AMAT P 5000 can be used with a variety of gas combinations, from dry etching, to oxide etching, to nitride etching and is available with a variety of batch oven configurations, allowing for intricate deposits of various materials. In conclusion, P5000 CVD reactor is an advanced deposition tool that offers a variety of deposition capabilities and process materials in a reliable and efficient platform. This system is designed to ensure quality and reproducibility of results with precise process control, and is an excellent choice for both research and industry applications.