Used AMAT / APPLIED MATERIALS P5000 #197548 for sale

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ID: 197548
Wafer Size: 4"
CVD Systems, 4" Part machines.
AMAT / APPLIED MATERIALS P5000 reactor is an advanced CVD tool used for high-quality, high-precision deposition of thin films and coatings for industrial, medical and scientific use. AMAT P-5000 is a production level machine that can deposit films in a variety of ways including plasma-enhanced, thermal and electron-beam evaporation. APPLIED MATERIALS P 5000 offers an affordable larger chamber size, allowing films and coatings to be applied over wide areas, such as flat or curved surfaces. With its huge chamber size, APPLIED MATERIALS P5000 can service two or more products at once. The design of AMAT P5000 ensures excellent coating quality, high throughput, repeatability and uniformity. The advanced hardware and software systems allow for precise deposition of films at high substrates temperatures and a wide range of chamber pressure. This enables deposition of films to specific thicknesses (from 0.1um to 10um). Furthermore, the equipment is equipped with an automatic in-situ chamber cleaning system, which reduces unit downtime and overall maintenance time. AMAT / APPLIED MATERIALS P-5000 also features an automated machine for gas dosing and monitoring. This allows for precise control of the gas and recipe parameters that control the deposition process. A range of gases can be used, including hydrogen, argon, oxygen, nitrogen and hydrogen chloride. The tool also has the ability to mix gases to enable the optimization of coating uniformity and profiles. APPLIED MATERIALS P-5000 is also equipped with a state-of-the-art automatic wafer mapping asset. This enables high accuracy in film thickness measurements and allows users to monitor real-time wafer data while deposition occurs. This model can also control and adjust the deposition process in order to maintain optimal results. P-5000 has a high level of compatibility with other industrial tools, making it well-suited to cross-platform integration. Additionally, it is backed by reliable customer service and a knowledgeable sales team. Overall, AMAT P 5000 reactor is an advanced CVD equipment that offers high-quality deposition of thin films and coatings for industrial, medical and scientific applications. With features such as an automated cleaning system, gas dosing unit and wafer mapping machine, P5000 delivers optimal performance and efficient production.
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