Used AMAT / APPLIED MATERIALS P5000 #293587249 for sale

AMAT / APPLIED MATERIALS P5000 is a multi-station platform sputtering reactor designed for advanced semiconductor fabrication. It is part of AMAT family of reactors and is primarily used for deposition of thin films for advanced semiconductor devices. AMAT P-5000 is a single chamber system with a range of film deposition processes. It is capable of sputter-deposition, evaporation and electron-beam evaporation. Optionally, APPLIED MATERIALS P 5000 can be utilized for additional services including chemical vapor deposition and ion implantation. A wide range of substrates, including silicon, germanium and gallium arsenide, can be processed using AMAT P 5000. It features a 55cm central rotating turret and comes equipped with up to four sputtering cathodes and two evaporation sources. P5000 is loaded with a load-lock chamber and substrate handling equipment to safely and efficiently transfer substrates from Wafer Carts or cassette-loaded Handler Pods into the process chamber. The cylindrical design of AMAT P5000 provides uniform distribution of the film thickness throughout the wafer surface. Its process recipes are designed for multi-layer deposition and can achieve a layer in thickness of less than 0.1 micrometer. P 5000 is capable of producing films with planar uniformity of +/-2nm, total thickness uniformity of +/-1.5nm, and line width uniformity of +/-1nm. Optionally, APPLIED MATERIALS P-5000 can be used with advanced process control methods like Active Magnetron Sputter Deposition (AMS) or Optical Post Treatment (OPT). In addition, APPLIED MATERIALS P5000 is also equipped with a robust set of safety features meeting today's highest standards for operator safety. Its comprehensive safety system has been designed in accordance with the current ANSI/SEMI Standard NFPA 79 and All safety components have been designed for high reliability and there are various levels of manual and automatic override for emergency situations. In conclusion, AMAT / APPLIED MATERIALS P 5000 multi-station platform sputtering reactor is a highly advanced and reliable deposition system for thin-film production. It is versatile enough to cover a wide range of deposition processes and its process recipes enable deposition of films in thicknesses exceeding 0.1 micrometer. Furthermore, its robust safety features make it one of the most reliable and safe deposition systems available today.