Used AMAT / APPLIED MATERIALS P5000 #293587332 for sale

AMAT / APPLIED MATERIALS P5000
ID: 293587332
Wafer Size: 6"
PECVD Systems, 6" (3) DXL 8-Slots storage.
AMAT AMAT / APPLIED MATERIALS P5000 series is an economical, all-purpose, low cost batch deposition Reactors for creating conformal, uniform and pinhole-free thin film coatings on substrates utilizing evaporation, sputter and/or plasma sources. AMAT P-5000 series is designed for semiconductor and/or nanofabrication-scale production of microelectronic, optoelectronic, MEMS, power device and other applications. APPLIED MATERIALS P 5000 series is designed for high repeatability, reliability and stability over its operating range, with a streamlined, modular approach that allows for easy tuning and versatility while meeting various requirements within the range. P-5000 incorporates an advanced continuous-flow reactor design which allows users to achieve uniformity and coverage even on difficult-to-coat structures and substrates. The reactor is fitted with a variable-rate pulsed power source, allowing users to closely monitor the deposition rate. AMAT P5000 series is designed to offer a low total cost of ownership, even with its high power capabilities, with a reduced need for costly spare parts and maintenance. As an economical solution for batch deposition processes, APPLIED MATERIALS P5000 series includes features such as the vacuum-isolated anti-contamination filter, which can be used to protect against contamination from byproducts. AMAT / APPLIED MATERIALS P 5000 series relies on single- or two-pump two-stage diffusion pumping systems and cryogenic cooling operation to achieve ultra-low pressures (< 1 x 10-7 Torr) and efficient temperature control in order to minimize the thermal effects on film performance. The reactor is designed to support processes requiring temperatures ranging from room temp to greater than 500°C. For enhanced user flexibility, APPLIED MATERIALS P-5000 series offers four control parameters for target thickness, uniformity and repeatability: power level, deposition rate, film thickness and time step. The device also features multiple process sensors and can be used in conjunction with large data acquisition systems. AMAT P 5000 series includes intuitive user interfaces, allowing for remote operation, knowledgeable personnel can effectively manage deposition without frequent hands-on adjustment of the system. Future updates and upgrades are also available for those needing further customization. The system is built for a long service-life.
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