Used AMAT / APPLIED MATERIALS P5000 #293604716 for sale

AMAT / APPLIED MATERIALS P5000 is a physical vapor deposition (PVD) reactor specifically designed for semiconductor production. It is typically used for critical applications, including deposition of thin films with excellent uniformity, high aspect ratio (AR) hardmask inkjet patterning, high density plating of nano-scale features, and resistive memory formation. It is capable of structuring and fine-tuning complex layer stacks with excellent gapfill between materials and controlled stoichiometry across composition. AMAT P-5000 has advanced control technology to provide consistent deposition results for high-volume production runs. It is a multi-purpose design, with an integrated Centralized Process Control (CPC) equipment and a powerful triple-axis closed-loop system. The CPC allows users to optimize process parameters in addition to controlling the sputter deposition rate. Its gas-flow models provide standard process control and adjustable flow rates for achieving desired deposition characteristics. Its thermal process control unit enables precise control over the placement, temperature, and uniformity of each layer. APPLIED MATERIALS P 5000 uses an all-axis sputtering technology, which is more efficient and provides more consistent results than traditional planar sputtering techniques. It has a total of four cathodes, two magnetrons, and two rotatable columns. This gives the process engineer the ability to optimize process control across multiple layers, giving the end-result a high degree of process uniformity and repeatability. The machine also employs a "mixed-film" deposition method that results in perfectly uniform layers with low line width bias and smooth sidewalls. APPLIED MATERIALS P5000 can process over 50 unique high-tech materials, including alloys, ceramics, polymers, and functional oxides. It is compatible with a wide variety of substrates, from standard CMOS to compound semiconductors. AMAT / APPLIED MATERIALS P-5000 also has an integrated RTP and C4 process tool, allowing users to achieve positional accuracy and high surface profiles for the highest-quality results. Overall, AMAT / APPLIED MATERIALS P 5000 is a reliable and advanced deposition tool designed for high-performance semiconductor production. Its intuitive process control, combined with its accurate deposition technology, yields high-quality results with excellent uniformity and repeatability. P 5000 offers an efficient, cost-effective solution for deposition processes.