Used AMAT / APPLIED MATERIALS P5000 #293606183 for sale

ID: 293606183
CVD System (3) Chambers.
AMAT / APPLIED MATERIALS P5000 is a multi-chamber deposition reactor designed to deposit thin films on a variety of substrates, enabling the production of a variety of electronic, optical, and other advanced materials. AMAT P-5000 has been used by semiconductor foundries, flat panel display producers as well as solar cell and memory device manufacturers for processes such as ALD, PVD, and PECVD. APPLIED MATERIALS P 5000 is a chemica vapor deposition reactor designed to increase fabrication speeds and reduce cost of ownership, while providing consistent process performance. It is capable of high-rate chamber switching and modular parallel processing of up to four chambers, and features efficient heat transfer and exhaust systems. P5000 features a high-efficiency temperature control system that helps reduce cycling time and substrate heating time from the first chamber to the last. It is also equipped with a modular process control system, allowing the user to control each chamber independently for more consistent, repeatable process parameters. AMAT P5000 is also capable of doing multiple processes in one single chamber, enabling high throughput and reducing time spent transferring wafers between chambers. APPLIED MATERIALS P-5000 supports a wide range of process options and is equipped with automated chamber configurations and end-of-run communications, making it suitable for a variety of applications such as dielectric, barrier, and etch processes. Its self-diagnostic capabilities can be accessed through its onboard maintenance and process programming, which allows easy troubleshooting and quick reactions to faults or process abnormalities. APPLIED MATERIALS P5000 can be equipped with various source types, such as RF, high frequency, and direct current sputtering, as well as hot and cold atomic beam sources. It is also capable of remote maintenance, allowing simplified communication and assistance from process and maintenance engineers. On top of that, it features a wide-range of accessories including yttrium-based sources, which provide enhanced uniformity, and titanium source heads, which provide improved protection. Overall, AMAT P 5000 reactor provides high uniformity and process repeatability, enabling the production of a variety of electronic, optical, and other advanced materials at fast speed and low cost. Its process control system makes it suitable for a wide range of applications, and its remote maintenance capabilities help to simplify trouble shooting and maintenance operations.
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