Used AMAT / APPLIED MATERIALS P5000 #293609012 for sale

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ID: 293609012
Wafer Size: 8"
Vintage: 1996
Etcher, 8" (3) Mark II Etch chambers: Resin/Arc, Oxide, Nitride, Silicon ENI OEM-12B Generator ESC Chuck Remote frame Does not include chiller 1996 vintage.
AMAT / APPLIED MATERIALS P5000 is a high-performance, DC diode sputtering and ion assisted deposition technology precision process reactor system. This versatile reactor is designed to allow users to employ the best deposition technique for their application by combining the benefits of both sputtering and ion-assisted deposition. AMAT P-5000 is specifically engineered for the fabrication of thin-film surfaces and components used in a variety of fields, including electronic, optical, semiconductor, microelectronic, MEMS, biomedical, and many other applications. At the heart of APPLIED MATERIALS P 5000 is an advanced microprocessor-controlled DC diode power source for accurate, consistent, and repeatable operation. The power source is capable of supplying up to 20kW of power. It offers a wide range of targets, substrates, and process gases to meet different requirements. APPLIED MATERIALS P-5000 can reach optimal performance with its innovative blanket deposition technology which offers uniform high-accuracy deposition throughout the wall-to-wall chamber with a single shutter cycle. This helps to reduce process time and material costs. Its advanced plasma reactors have a total of four lamps that provide stable and uniform power in the plasma chamber. APPLIED MATERIALS P5000 also features a magnetron to control the electron emission rate in the chamber. This allows for faster sputtering rates and improved uniformity of the deposit. P5000 provides a number of additional features that make it a great choice for the successful fabrication of a wide range of thin-film substrates. It includes an automated indexer to prevent substrate damage from misalignment. Its pressure control allows for optimal vacuum pressure in the chamber and its substrate heating function can be used to improve deposition yield and quality. AMAT P 5000 provides excellent performance, stability, and ease of use. It can be used to efficiently fabricate a wide range of thin-film substrates with superior uniformity and precision. This makes it an ideal tool for producing unique, high-performance media for various applications.
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