Used AMAT / APPLIED MATERIALS P5000 #293616570 for sale

AMAT / APPLIED MATERIALS P5000 is a single-wafer, high-throughput, plasma immersion ion implantation (PIII) reactor. It is a versatile system suited for a wide range of applications, ranging from advanced packaging and device integration to R&D and high-volume manufacturing. AMAT P-5000 provides excellent maximum dose uniformity and outstanding wafer-to-wafer repeatability, making it the preferred choice for critical applications such as TSV, oLEDs, MEMS, FinFETs and 3D-ICs. APPLIED MATERIALS P 5000 is equipped with a twin-pocket, forced-mode load-lock capable of processing six inch wafers, as well as a sealed chamber containing advanced plasma source and magnetic confinement assemblies. The twin-pocket design ensures that wafers are easily loaded/unloaded at reasonable times for improved throughput. P5000 also features a computerized control system with a user-friendly graphical interface for easy setup, parameter control and data acquisition. It includes all necessary parameter settings, monitors and alarms for efficient operation. With a deep chamber design and a unique spherical substrate holder, APPLIED MATERIALS P-5000 can hold wafers using full reflectance, resulting in optimum wafer-to-wafer uniformity and process repeatability. The powerful plasma source and advanced magnetic-confinement assemblies provide homogeneous ion bombardment across the entire wafer with excellent uniformity across its diameter. A key feature of AMAT P5000 is its low-energy implantation capability. With a beam energy range of 1-100 keV and a total on-wafer dose that can range up to 600 uC/cm2, APPLIED MATERIALS P5000 reactor provides industry-leading implant efficiency and ion dose control. Combined with a uniformity performance of <2%, P-5000 is perfect for demanding, high-precision implantation applications in the automotive, medical and consumer electronics markets. In combination with its stringent control, optimization and process repeatability, AMAT / APPLIED MATERIALS P 5000 is highly reliable, stable and efficient for implanting dopants into substrates. It is an excellent choice for R&D as well as high-volume production.