Used AMAT / APPLIED MATERIALS P5000 #293622411 for sale

AMAT / APPLIED MATERIALS P5000 is a production-scale atomic layer deposition reactor. This reactor is engineered for high-throughput deposition of nitrides, oxides, and fluorides onto large substrates. The reactor is built on a multi-stage platform, allowing for the deposition of multiple layers of different materials in a single run. Its processing chamber is made from stainless steel and is supported by a Graphite-faced quartz susceptor to ensure uniform temperature across the wafer. The reactor is powered by a quartz crystal Micro Balance (QCM) equipment with a target deposition rate of 30-200 A/min. The deposited films are uniform in thickness, conformal, and pinhole-free. AMAT P-5000 features a precision dual-level ABC Auto-Calibration System, which enables the control of substrate temperature with a margin of error as low as 0.5°C. Coupled with this unit are advanced safety features, such as Circuit Breaker Machine and Over/Under Temperature Shutoff. These safety systems shutoff power to the chamber if the temperature exceeds safe limits, eliminating the risk of wafer damage. Moreover, its optional purge tool ensures the detection and removal of particles and gases inside the chamber in order to produce pinhole-free films. APPLIED MATERIALS P 5000 also offers an advanced multi-channel gas management asset. This model is engineered for precise and reliable control of the deposition sequence. It includes special software, allowing for the evaluation of all process parameters for optimizing film quality and throughput. On top of all this, AMAT / APPLIED MATERIALS P 5000 reactor is flexible and customizable. The user has the option to set up their own process sequences and adjust deposition parameters in order to fit their specific application needs. Overall, AMAT P5000 atomic layer deposition reactor is a powerful and reliable tool for high-quality deposition of thin films. It offers advanced safety features and precise control systems to ensure quality and consistency. With its customizable platform and user-friendly interface, this reactor is an ideal choice for production-scale deposition of nitrides, oxides, and fluorides.