Used AMAT / APPLIED MATERIALS P5000 #293631606 for sale
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ID: 293631606
PECVD System, 6"
(2) DhL Process chambers
Missing parts:
Throttle valves
Forelines
ATM Sensor.
AMAT / APPLIED MATERIALS P5000 is a 4-chamber next-generation reactor designed for high-volume production of semiconductor materials. The system is capable of high-volumes and high-yields while still providing an excellent quality product. This is due in part to the multiple-chamber design of the reactor, which allows for up to four different processes to be carried out in sequence. This allows for efficient production of high-quality compounds. The system is powered by a 55KW three-phase AC motor, and is equipped with a variety of safety features, such as interlocks and contactors. This ensures safe and efficient operation and the efficient usage of energy. The exterior of the system is constructed of stainless steel for corrosion and wear resistance, and the interior features four separate reaction chambers. The first chamber is the pre-heating chamber, and is used to treat wafers as an additional source of material and as an additional stage of pre-treatment prior to moving on to the other chambers. The second chamber is the actual reaction chamber, where the desired reaction is conducted. The third chamber is the degasification chamber, where the by-products of the reaction are removed. Finally, the fourth chamber is the post-treatment chamber, where additional manipulations of the material can be done. Due to its design, AMAT P-5000 is capable of producing high-quality products in large volumes with a low cost of production. It is also equipped with a range of software and automation features, allowing it to be easily operated with minimal manual intervention. This makes it ideal for use in high-volume production applications and semiconductor fabrication.
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