Used AMAT / APPLIED MATERIALS P5000 #293690473 for sale

'AMAT / APPLIED MATERIALS P5000' reactor is a single wafer process tool used primarily in MEMS and semiconductor industry, providing high-precision and high-performance processes, including thin film deposition. AMAT P-5000 uses a vacuum deposition source in order to deposit thin film layers on silicon wafers. It is an industry-leading equipment for semiconductor, MEMS and optoelectronic applications. The system consists of a modular design enabling up to four wafer sources operated at the same time in a 1x2x2 configuration. The unit also features a robotic machine for substrate handling, which is designed to work up to 4" substrates but allows for 5" process runs as well. The thin-film deposition process available in APPLIED MATERIALS P 5000 allows for the deposition of the material with uniformity across the entire wafer. An additional feature of this tool is the built-in oxidation and nitridation processes, which enables the deposition of oxidized materials. The advanced thin wafer technology used by P5000 allows for the deposition process to be more precise and uniform compared to other equipment available. The asset is specifically designed to target particular thin-film layers as small as 10nm. The substrate heaters are actively controlled and heated up to high temperatures during the process ensuring improved uniformity and uniform thin film layers. In addition, the model is equipped with RF, DC, and microwave power sources, which enable the synthesis of complex materials and structures. The equipment allows for high amounts of throughput, as it can process up to 50 wafers per hour. All the parameters related to the deposition process can be controlled through the embedded control system, thus allowing for optimized parameters for each deposition process. Additionally, the unit is designed to accommodate a wide range of substrate materials and thickness of substrates. In conclusion, P 5000 is an advanced machine for thin-film deposition processes and is specifically designed for MEMS and semiconductor requirements. It is an excellent tool for research and development as it allows for precise thin-film deposition and uniformity across the entire wafer. With features such as temperature control systems and automated handling, P-5000 is a powerful and reliable tool for thin-film depositions.