Used AMAT / APPLIED MATERIALS P5000 #293729488 for sale

AMAT / APPLIED MATERIALS P5000
ID: 293729488
Wafer Size: 6"
Vintage: 1989
CVD System, 6" Process: TEOS 1989 vintage.
AMAT / APPLIED MATERIALS P5000 Reactor is a specialty semiconductor tool used for a variety of applications. It is a unique platform that can be flexibly configured for a variety of processes, including plasma etching, deposition, and cleaning. The tool consists of a stainless-steel vacuum chamber which is pumped out to a base pressure of several millitorr. The chamber is thermally and vibrationally isolated by the shroud components to ensure stable base-level conditions during operation. The upper table equipment, located in the chamber, houses the electrode and wafer holders which are connected to the power supplies. The wafer holder can support up to two wafers in dual-wafer holders. The electrode is suspended above the wafer surface, assuring uniform plasma loading on the wafers. AMAT P-5000 Reactor utilizes a gas delivery system, including a gas panel and manifold, to configure the chamber with the necessary process gases. A recirculating unit allows the chamber to maintain low levels of backside outgassing to prevent product contamination. A unique HEPA filtration machine can be incorporated to reduce airborne particles. The recipe manager, located in the base of the tool, is responsible for controlling the various recipes and settings for the processes. All temperature, pressure, and plasma settings can be adjusted to optimize throughput and yield accordingly. APPLIED MATERIALS P 5000 Reactor is a reliable workhorse for many advanced integrated circuit processing strategies. Its flexibility and capacity for custom configurations make it an effective tool for a wide range of applications. Its unique design enables process engineers to take advantage of the latest processing techniques to achieve high yields at competitive throughputs.
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