Used AMAT / APPLIED MATERIALS P5000 #293759466 for sale

ID: 293759466
Wafer Size: 8"
Etcher 1998 vintage.
AMAT / APPLIED MATERIALS P5000 reactor is an advanced deposition equipment designed for a wide range of processes, from high-precision films to dielectric films, photoresist films, and other specialty films for electronic, optical, and other applications. AMAT P-5000 offers complete flexibility for controlling process variables, and features an advanced PECVD chamber with high-performance plasma source and optimized substrate treatment, as well as a high-accuracy automatic substrate positioning system. APPLIED MATERIALS P 5000's process solutions are tailored to provide improved uniformity and step coverage, reduce resistivity, and optimize stress. It offers advanced throughput, uniformity, and wafer-to-wafer repeatability. P5000 allows a wide range of materials to be processed, including silicon, gallium arsenide, gallium nitride, and indium phosphide. In addition to the improved uniformity and step coverage benefits, P 5000 also offers enhanced process control that ensures accuracy and repeatability for desired films. Its automatic adaptive process-control algorithms provide real-time access to deposition parameters and enable users to adjust deposition conditions in response to film criteria, guaranteeing the desired results. Furthermore, AMAT P 5000 offers additional flexibility by allowing the operator to switch the chamber size, type, and material composition in the midst of film deposition. The unit also features an advanced automated substrate handling subsystem, with automated claim-check machine, temperature control, and special gas handling capabilities for specialty materials. AMAT / APPLIED MATERIALS P-5000 reactor is designed for high-speed operation and is compliant with all relevant semiconductor industry environmental regulations. It is equipped with clean air filtration and a stainless steel passivated surface that prevents chemical reaction during operation. APPLIED MATERIALS P-5000 provides significant advantages in the fabrication of thin-film structures versus the traditional deposition methods such as sputtering and thermal evaporation. With its high-performance plasma generated source and optimized substrate treatment, APPLIED MATERIALS P5000 offers uniformity and coverage, improved film control and improved throughput. P-5000 is used in a variety of industries, including electronics, optoelectronics, photonics, data storage, medical, and more.
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