Used AMAT / APPLIED MATERIALS P5000 #9005018 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9005018
Matching networks, many available.
AMAT / APPLIED MATERIALS P5000 is a plasma-based dry etching equipment designed to provide uniform and reproducible etching of materials in a variety of advanced applications. It is a single-wafer micro-reactors capable of supporting etching-related processes such as surface cleaning, layer etching, and dielectric etching in a fast and reliable manner. As a micro-reactor, AMAT P-5000 also facilitates the cost-efficient production of complex patterns and intricate device structures with high uniformity and repeatability. Specifically, it enables efficient production of ultra-shallow device features, down to 10 nanometers in depth and with run-to-run variation of less than 2 nanometers. This level of control is enabled by APPLIED MATERIALS P 5000's plasma-based dry etching technology. P 5000 utilizes a cryogenically-cooled plasma source, a drive-scope match network and an elec-scope source power to generate and maintain a stable etching plasma free of impurities. Through the combination of these components, P5000 is able to ensure a highly uniform bottom-up etch, as well as high-precision feature patterning, leading to improved device yield and reduced costs. AMAT P 5000 is also compatible with single-wafer and cassette/cluster configurations, and is able to negotiate a wide range of materials including silicon, germanium, gallium arsenide, and aluminum. This, in combination with its simplified chamber and modular design, makes it the ideal choice for reducing cost, while still providing consistent results. Moreover, safety features like the Integrated Vac system are built into P-5000, ensuring a safe and controlled working environment while eliminating the chance of undesired gas leakage. Likewise, the unit also features machine monitoring, process control, and automated recipe building capabilities. In conclusion, APPLIED MATERIALS P5000 is an innovative and intuitive micro-reactor that enables efficient and precise etching of materials for a variety of advanced applications. Its uniform and reproducible etching capabilities, coupled with its high-precision feature patterning, and reliable safety features make it an extremely capable, cost-effective and reliable tool for any organization looking for high-quality performance.
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