Used AMAT / APPLIED MATERIALS P5000 #9037975 for sale
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ID: 9037975
Wafer Size: 8"
Vintage: 1997
PECVD System, 8"
Process: SA-BPSG
TEOS with (3) CVD Chambers
1997 vintage.
AMAT / APPLIED MATERIALS P5000 is a chemical vapor deposition (CVD) platform that provides superior automation and process control capability. AMAT P-5000 includes automated process control and chamber control subsystems that allow for rapid, repeatable and stable high temperature deposition. This capability has enabled enhanced control of the surface properties, film thickness and uniformity, as well as superior process yields. APPLIED MATERIALS P 5000 can be utilized for metal, metal alloy, and metal-oxide layers, as well as for barrier layer applications such as the deposition of carbon, silicon oxynitride, or silicon nitride. The reactor has a high temperature range that is capable of reaching up to 1200°C. The system supports both LPCVD (low pressure, chemical vapor deposition) and PECVD (plasma-enhanced CVD). The reactor features an automated process controller, two stage-turbomolecular pumping, multiple gas flow controllers, and a mass flow controller. APPLIED MATERIALS P-5000 allows for precise control over the deposition protocol and allows for advanced substrate treatments such as etching, annealing, oxide deposition, and metal lift-off. It also includes various advanced polishing techniques that allow for superior surface finish and enhanced topography. The system can be easily integrated with an existing production environment, providing an efficient solution that is both time and cost effective. AMAT / APPLIED MATERIALS P-5000 is a robust and reliable system, capable of producing superior quality films and substrates. Its automation capabilities and process control functions have proven to be invaluable in the fabrication of high precision optics, microelectronics, and other components. The low maintenance and ease of use make it an ideal tool for use in research and development laboratories as well as in manufacturing settings.
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