Used AMAT / APPLIED MATERIALS P5000 #9040992 for sale

AMAT / APPLIED MATERIALS P5000 is a next-generation high-performance plasma reactor designed for superior process performance and reliability in advanced semiconductor applications. This type of reactor, also known as a high density plasma (HDP) reactor, utilizes magnetically enhanced plasma to improve deposition rate, Thin Film Layer uniformity, dielectric and metal deposition properties. AMAT P-5000 HDP reactor boasts a number of key features that make it a valuable asset for device and material innovation in the semiconductor industry, including: Multi-furnace design: This patented design employs a multi-furnace style construction to ensure constant and uniform heating for the wafer. This feature is critical for the repeatable and accurate deposition of materials on the wafer. Low-temperature operation: APPLIED MATERIALS P 5000 has a low-temperature operation range, allowing for faster deposition and high material compatibility with both standard and low-k device fabrication. Hyper-accurate temperature control: To further improve the temperature accuracy of P-5000, the reactor utilizes a hyper-accurate temperature control system to ensure precise and repeated deposition of material. Multiple substrate compatibility: This reactor is designed to be highly compatible with various substrate materials, allowing for superior deposition of both dielectric and metal-containing materials. High-density plasma: P 5000 HDP reactor utilizes magnetically enhanced plasma that increases deposition rate, Thin Film Layer uniformity, and dielectric/metal deposition properties. Remote diagnostic: This reactor offers remote diagnostic capabilities, allowing for real-time, onsite troubleshooting and maintenance of the machine. APPLIED MATERIALS P-5000 HDP reactor is a powerful, next-generation reactor that is capable of performing superior deposition and material innovation in the semiconductor industry. The addition of a magnetically enhanced plasma improves the deposition rate, uniformity, and material compatibility, making AMAT / APPLIED MATERIALS P 5000 ideal for precise and repeatable processing of materials on a variety of substrates. With its low-temperature operation, precise temperature control, and remote diagnostic capabilities, AMAT / APPLIED MATERIALS P-5000 HDP reactor is a powerful reactor capable of delivering superior performance and reliability.