Used AMAT / APPLIED MATERIALS P5000 #9056702 for sale
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ID: 9056702
Vintage: 1999
PECVD System, 8"
Mark II P5000 mainframe
(4) Chambers
15 slot storage elevator
8” Cassette Handler
Bolt down load luck lid with purge
Phase III robot
Remote Rack with (2) ENI OEM 12B 13.56Mhz generators
Steelhead Heat Exchanger
Thru the wall interface with (2) monitors: (1) TTW, (1) stand alone
PLIS Cabinet
PLIS Minicontroller
DPS generator rack with ENI DPG-10 Generator and DPA Interlock board
Chamber A:
Universal PECVD chamber
Cluster Throttle valve
Gold Style Lamp module
Phase IV RF match
Dual manometers with 100/1000 Torr manometers
Unit 1660 MF calibrated to customer spec
STEC LF-410 LFM’s and 2410 injectors calibrated to customer spec
Chamber B:
Standard PECVD chamber
Cluster Throttle Valve
Gold Style Lamp Module
Phase IV RF Match
Dual manometers with 10/1000 Torr manometers
1660 MFC’s calibrated to customer spec
1999 vintage.
AMAT / APPLIED MATERIALS P5000 reactor is a high-performance processing equipment specifically designed for deposition, etching, and other related thin-film processing of semiconductor, thin film semiconductor and magnetic material. This tool is used for both volume production as well as R & D applications. AMAT P-5000 reactor has a laser & optical process module and a capable CPU/DSP based controller. The laser & optical process module is a 6-axis motion system, with a linear vacuum chamber mounted on a precision linear rail, allowing for accurate and repeatable movement. The laser & optical process module consists of a high-resolution laser unit, a focus camera, and fiber-optic and laser communications. The CPU/DSP based controller offers programmable control of parameters including gases and feedstock, RF and DC biasing, wafer temperature, time, energy, and acceleration. APPLIED MATERIALS P 5000 reactor also features a convection machine, which is capable of providing multiple temperatures over a large range of processing conditions. It is equipped with several gas distribution systems, such as a high-rate mass flow controller and a low-rate mass flow controller. The gas distribution tool helps to control the temporal and spatial distribution of the reactant species in the reactor. Radio Frequency (RF) and Direct Current (DC) biasing can also be applied during processing, allowing for the generation of active species in the reaction. AMAT / APPLIED MATERIALS P 5000 reactor also has a number of process-enhancing features. A high-vacuum exhaust asset is included in the model, allowing for fast, efficient evacuation of reaction by-products. Additionally, the equipment is designed to quickly take wafer samples, allowing for continual refinement and improvement of the process. AMAT / APPLIED MATERIALS P-5000 reactor is an effective tool for achieving superior performance in deposition, etching, and other related thin-film processing of semiconductor, thin film semiconductor and magnetic materials.
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