Used AMAT / APPLIED MATERIALS P5000 #9056845 for sale

AMAT / APPLIED MATERIALS P5000 is a high-end, high-performance etch reactor used by advanced semiconductor manufacturers to fabricate integrated circuits. It is a high-pressure, high-temperature etch reactor designed to address issues associated with scaling the micro- and nano-structures of the latest integrated circuits. AMAT P-5000 employs dual-frequency wafer chuck to individually position and clamp the wafer. This allows for more efficient and accurate etch processing. Moreover, the reactor is equipped with a multi-tone time-of-flight mass spectrometer (TOFMS) for precise control of etch processes. This ensures that the etch deposition is controlled to the nanometer level. APPLIED MATERIALS P 5000 also employs high-efficiency RF generator and RF power source to significantly reduce power loss during the etching process. AMAT P5000 utilizes an advanced automated system for precise monitoring of the etch process. This includes high-definition digital cameras for direct visualization of the etch during processing, as well as high-end vision and guidance systems for precise control of the etch chamber and wafer chuck movements. Additionally, the reactor utilizes a sophisticated data acquisition and processing system for precise and precise analysis of the etch product. P 5000 is equipped with a full suite of sensor technologies, including infrared, ultraviolet and visible spectroscopy, imaging, and particle counting. This allows for rapid and accurate characterization of the etch product. Moreover, the etch chamber is also equipped with ultra-fast temperature measurement, which ensures precise control of the chamber temperatures. In sum, APPLIED MATERIALS P5000 is a high-end, high-performance etch reactor that is ideal for use in advanced semiconductor manufacturing. It includes advanced automation and precise control capabilities, allowing for production of cost-effective and accurate integrated circuits.