Used AMAT / APPLIED MATERIALS P5000 #9058265 for sale

AMAT / APPLIED MATERIALS P5000 is a high-performance, high-capacity plasma etching equipment specifically designed to meet the needs of modern semiconductor production. AMAT P-5000 utilizes advanced optical and RF technology to provide high levels of patterning accuracy and uniformity with controlled etch profiles. This system is capable of etching up to 20 wafers per hour with a feature size resolution of 15nm. APPLIED MATERIALS P 5000 features an integrated integrated gas delivery unit which enables full control over the plasma process, including automatic gas management and endpoint determination. This allows for greater flexibility and control of the etch chemistry for improved process reliability and repeatability. P-5000 is equipped with an advanced plasma control automation suite which provides detailed monitoring and analysis of the etching processes. This allows for optimization of the process to maximize the throughput. It also provides built-in self-diagnostic functions which automatically check and adjust the process parameters. APPLIED MATERIALS P-5000 also features a dual-chamber design which enables the highest throughput possible, as well as improved process stability. The chambers are designed to provide the best cooling for the wafers and reduce the risk of dielectric and plasma damage. The dual chambers also allow for maximum gas utilization and ensure uniformity across the wafers. P5000 is also equipped with an advanced optical diagnosis machine which enables on-the-fly OPC processing. This ensures accurate and repeatable etching patterning results. Finally, AMAT P5000 is integrated with a setup station, a cleanup station and an in-situ metrology tool. This ensures the highest throughput and uniformity of the wafers. The setup station ensures precise wafer orientation and provides an easy-to-use touchscreen interface for quick loading and unloading of wafers. The in-situ metrology asset scans wafers for data accuracy and provides precise feedback to the process control model. Overall, P 5000 is a highly advanced process tool designed to meet the demands of modern semiconductor production. Featuring advanced optical and RF technology, a dual-chamber design, an integrated gas delivery equipment, plasma control automation suite and an in-situ metrology system, this unit is capable of providing the highest levels of quality and throughput in a production line.