Used AMAT / APPLIED MATERIALS P5000 #9069051 for sale
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AMAT / APPLIED MATERIALS P5000 is an Physical Vapor Deposition (PVD) reactor designed for advanced semiconductor applications. It offers a reliable and cost-effective platform for research and development applications, as well as volume production requirements. AMAT P-5000 PVD equipment consists of four major components: a mechanical housing, a vacuum chamber, a gas line assembly, and a plasma control unit. To facilitate process control, the system is equipped with an advanced touchscreen Graphical User Interface (GUI). This graphical interface allows operators to easily configure APPLIED MATERIALS P 5000 to individual process needs. The ultra-durable stainless steel mechanical housing of P-5000 provides a clean vacuum environment for optimum process accuracy and performance. A single door entrance is provided to facilitate access to the materials to be processed within the vacuum chamber. An integrated gas delivery unit allows for the optimized flow of process gases necessary to the manufacturing environment. The vacuum chamber of AMAT / APPLIED MATERIALS P 5000 is highly efficient and reliable due to it's advanced multi-walled construction. This multi-walled construction allows for a significant improvement in thermal conductivity, delivering optimum uniformity and consistently repeatable wafer production results. The plasma control unit of APPLIED MATERIALS P-5000 is equipped with a variety of powerful automation features. This includes the ability to control wafer flow, enable self-diagnostics, configure process recipes and enable manual control. This unit also includes a unique auto-leveling feature to ensure the most accurate deposition results. Finally, AMAT P5000 is equipped with a range of safety features to ensure the safe operation of the machine. This includes an automatic tool shut-off, emergency off-cycle protection, and an optional monoxide protection. Overall, AMAT P 5000 is designed to provide an efficient, reliable and cost-effective platform for advanced semiconductor applications. The asset is ideal for research and development applications, as well as volume production requirements. It is equipped with a range of advanced features to ensure consistent repeatable wafer production results and reliable operation in a safe and efficient manner.
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