Used AMAT / APPLIED MATERIALS P5000 #9077991 for sale

AMAT / APPLIED MATERIALS P5000 reactor is an advanced chemical vapor deposition equipment designed for precision deposition of ultra-thin films. This versatile tool is ideal for the deposition of dielectrics, metals, oxides, nitrides and polysilicon layers. With its high throughput and excellent uniformity, AMAT P-5000 is one of the most power tools available for demanding deposition applications. APPLIED MATERIALS P 5000 reactor provides superior uniformity and homogeneity across large wafer surfaces. It is equipped with a high-power electron beam gun that allows for fast deposition rates. This electron beam gun operates at powers up to 5000 watts, which means that deposition processes can be completed quickly and with superior uniformity. The flexibility of APPLIED MATERIALS P-5000 allows users to adjust both time and power settings in order to achieve optimal film quality. The system is equipped with a ceramic chamber that has a flat-bottomed design. This design provides increased uniformity in the deposition process and ensures a consistent thickness of the film. The flat-bottomed design also eliminates internal mechanical reflections and eliminates shadowing, ensuring perfect uniformity. AMAT / APPLIED MATERIALS P-5000 reactor uses high-purity, high-purity raw materials for deposition. Its in-situ gas delivery unit is designed for precise control of chamber conditions, ensuring that a precise amount of raw materials is within the chamber space for optimal process stability. A wide array of standard and custom recipes is also available for optimized deposition of dielectrics, metals, oxides and polysilicon layers. In terms of safety and performance, P5000 reactor is equipped with various safety systems. These include a power monitoring machine, a halogen gas monitoring tool, a gas discharge asset, a pressure leak detector and a flow rate monitor. Additionally, P-5000 reactor is also equipped with an advanced monitoring model that provides real-time information about chamber conditions and performance. AMAT P5000 reactor is a versatile and reliable tool for the deposition of ultra-thin films. With its high throughput and excellent uniformity, P 5000 offers superior deposition capabilities and wide range of process options. This powerful tool is ideal for demanding deposition applications, and can process high-purity, high-purity raw materials for deposition. AMAT P 5000 is an advanced process tool designed for precision and optimized film deposition.