Used AMAT / APPLIED MATERIALS P5000 #9081365 for sale

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ID: 9081365
Vintage: 1994
System (2) Chambers Process: SIO2-depos/SiN depos/ BPSG Chemicals:Silan/N2O/NH4,PH3,C2F6,B2H6 (1) Pump (1) Chiller Software Rev.: B5.01C CE Marked: no (3) 208V 1994 vintage.
AMAT / APPLIED MATERIALS P5000 is an advanced, production-scale etch reactor used in the fabrication of thin-film magnetic recording media. This piece of equipment is designed to etch patterns into thin-film material with high precision and accuracy. AMAT P-5000 utilizes a number of different technologies in order to effectively etch thin-film material. APPLIED MATERIALS P 5000 uses a combination of ion beam etching (IBE) and radio frequency (RF) etching technologies to achieve its desired results. Ion beam etching utilizes a beam of accelerated ions to score patterns into thin-film material, while RF etching technology is employed to enable more precise focusing profiles within a single/multiple ion beam exposure. Both technologies are combined in P 5000 for maximum results and precision. APPLIED MATERIALS P-5000 also incorporates a programmable embedded AC drive motor for precise control over the etching and exposure process for thin-film material. This motor is used to control the beam placement and exposure of the thin-film material. The AC drive motor also controls the movement of the stages and tracks which house the ion beam source and exposure area. This ensures that the thin-film material is exposed to the correct and exact amount of ion beam exposure needed. AMAT P5000 also features advanced, user-friendly software that helps to monitor, operate, and control the entire ion beam etching process. This software is designed to provide users with a clear process control interface, permitting them to monitor and set parameters for the etching of the thin-film material. The software also provides error monitoring and alarm systems for any errors or problems that may arise during the etching process. Finally, P5000 also includes an array of safety features for maximum ease-of-use and protection. From multiple interlocks to sophisticated monitoring systems, APPLIED MATERIALS P5000 provides a high level of safety when carry out etching operations. These features ensure that etching operations are carried out with precision and are completed safely and efficiently. In conclusion, AMAT P 5000 is a high-precision, production-scale etch reactor designed for the fabrication of thin-film magnetic recording media. Utilizing a combination of ion beam etching and radio frequency etching technologies, P-5000 is the ideal tool for etching thin-film materials with accuracy and precision. In addition, AMAT / APPLIED MATERIALS P-5000 includes a programmable embedded AC drive motor, advanced user-friendly software, and a number of safety features for operator protection and comfort.
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