Used AMAT / APPLIED MATERIALS P5000 #9081649 for sale

AMAT / APPLIED MATERIALS P5000 Reactor is a robust chamber that is designed for use in a variety of high temperature and ultra-high vacuum applications. This reactor is capable of reaching temperatures up to 1000°C and provides uniform temperatures across the entire process chamber. It is designed to be used in applications such as: film depositions, etching, oxidation, crystallization and diffusion. AMAT P-5000 Reactor is a high-performance, high-throughput processing chamber that is suitable for a wide range of applications. It is comprised of a graphite chamber, with a tungsten filament mounted on the side and a tantalum hearing element in the center of the chamber. The heating elements ensure that uniform temperatures are achieved and maintained in the process chamber at all times. The graphite chamber is made from high grade graphite, which provides excellent heat conduction, allowing for rapid and consistent temperature changes. Additionally, APPLIED MATERIALS P 5000 also features a built-in metrology system that allows for real-time monitoring of the temperature in the chamber. This allows for better process control and optimization of the deposition process. P 5000 Reactor is constructed to provide superior uniformity and accuracy in the deposition process. With its precision temperature control and large process chamber, it supports a wide range of materials such as metals, plastics, and films. APPLIED MATERIALS P5000 Reactor can also be used with various configurations of source materials, allowing a wider range of possible deposition materials. Furthermore, P-5000 Reactor can achieve a fast heating rate with a broad operating temperature range. It also ensures repeatable and uniform film thicknesses throughout the whole process chamber. AMAT / APPLIED MATERIALS P 5000 Reactor is a highly reliable, durable and efficient process chamber that is perfect for many different types of deposition processes. It is capable of reaching temperatures up to 1000°C, delivering uniform temperatures across the entire process chamber and providing a high degree of process control. P5000 Reactor is equipped with a metrology system for real-time monitoring, and its design ensures fast heating rates and repeatable film thicknesses. AMAT P5000 Reactor is suitable for a variety of materials and is an excellent choice for any deposition application.